SCHEMBL17639907

SCHEMBL17639907

CC(C)c1cc(C(C)C)c(S(=O)(=O)OCCS(=O)(=O)O)c(C(C)C)c1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FABP4 P15090 6/20 0.57
FABP3 P05413 2/20 0.57
FABP5 Q01469 1/20 0.57
ENPP3 O14638 2/20 0.39
ENPP1 P22413 2/20 0.39
GAA P10253 1/20 0.37
ALDH1A1 P00352 1/20 0.37
GABRA1 P14867 1/20 0.36
GABRB2 P47870 1/20 0.36
SOAT2 O75908 1/20 0.35
MYC P01106 1/20 0.35
SOAT1 P35610 1/20 0.35
MAP2K3 P46734 1/20 0.35
HDAC1 Q13547 1/20 0.34
PSEN1 P49768 1/20 0.34
PSEN2 P49810 1/20 0.34
APH1B Q8WW43 1/20 0.34
NCSTN Q92542 1/20 0.34
APH1A Q96BI3 1/20 0.34
PSENEN Q9NZ42 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14838304 0.81 FABP4 (0.49) FABP4FABP3FABP5ENPP3ENPP1
SCHEMBL11888501 0.80 FABP4 (0.55) FABP4FABP3FABP5ENPP3ENPP1
SCHEMBL24503612 0.79 FABP4 (0.46) FABP4FABP3FABP5ENPP3ENPP1
SCHEMBL16382407 0.77 FABP4 (0.45) FABP4FABP3FABP5ENPP3ENPP1
SCHEMBL15082948 0.77 FABP4 (0.51) FABP4FABP3FABP5ENPP3ENPP1
SCHEMBL14527553 0.77 FABP4 (0.51) FABP4FABP3FABP5ENPP3ENPP1
SCHEMBL16382355 0.77 FABP4 (0.44) FABP4FABP3FABP5ENPP3ENPP1
SCHEMBL15082971 0.76 FABP3 (0.44) FABP4FABP3FABP5ENPP3ENPP1
SCHEMBL18232627 0.76 FABP4 (0.47) FABP4FABP3FABP5GAAGABRA1
SCHEMBL2946584 0.76 FABP4 (0.62) FABP4FABP3FABP5ENPP3ENPP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9604921-B2 Sulfonium salt, resist composition and resist pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-28 US disclosed
US-9604921-B2 Sulfonium salt, resist composition and resist pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-28 US disclosed
US-20160090355-A1 SULFONIUM SALT, RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-31 US disclosed
US-20160090355-A1 SULFONIUM SALT, RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160090355-A1 SULFONIUM SALT, RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS ETV6, ETV1, EIF2B3 FABP4 2861/4885FABP3 3929/4885FABP5 1932/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.