⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1764241 | 1.00 | — | — | |
| SCHEMBL251330 | 0.80 | — | — | |
| SCHEMBL9343471 | 0.79 | THRB (0.33) | — | |
| SCHEMBL471755 | 0.77 | THRB (0.32) | — | |
| SCHEMBL321309 | 0.77 | THRB (0.32) | — | |
| SCHEMBL28336596 | 0.76 | — | — | |
| SCHEMBL17995456 | 0.76 | — | — | |
| SCHEMBL333073 | 0.74 | THRB (0.42) | — | |
| SCHEMBL9211057 | 0.74 | THRB (0.42) | — | |
| SCHEMBL333072 | 0.74 | THRB (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1655772-B1 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GAS FOR PLASMA CVD | TOKYO ELECTRON LTD (JP) | 2011-09-28 | — | — | EP | disclosed |
| US-20110124928-A1 | Gas production facility, gas supply container, and gas for manufacture of electronic devices | ZEON CORPORATION (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7704893-B2 | Semiconductor device, method for manufacturing semiconductor device and gas for plasma CVD | TOKYO EECTRON LIMITED (JP) | 2010-04-27 | — | — | US | disclosed |
| US-7648922-B2 | Fluorocarbon film and method for forming same | KYOTO UNIVERSITY (JP) | 2010-01-19 | — | — | US | disclosed |
| US-20080285144-A1 | Optical Element | ZEON CORPORATION (JP) | 2008-11-20 | — | — | US | disclosed |
| US-20070282142-A1 | Gas Production Facility, Gas Supply Container, And Gas For Manufacture Of Electronic Devices | ZEON CORPORATION (JP) | 2007-12-06 | — | — | US | disclosed |
| EP-1830219-A1 | OPTICAL DEVICE | ZEON CORPORATION (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-20070020951-A1 | Fluorocarbon film and method for forming same | ZEON CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| EP-1744092-A1 | APPARATUS FOR PRODUCING GAS, VESSEL FOR SUPPLYING GAS AND GAS FOR USE IN MANUFACTURING ELECTRONIC DEVICE | OHMI, Tadahiro (JP) | 2007-01-17 | — | — | EP | disclosed |
| US-20060264059-A1 | Semiconductor device, method for manufacturing semiconductor device and gas for plasma cvd | ZEON CORPORATION (JP) | 2006-11-23 | — | — | US | disclosed |
| EP-1655772-A1 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GAS FOR PLASMA CVD | TOKYO ELECTRON LIMITED (JP) | 2006-05-10 | — | — | EP | disclosed |