Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | TSHR | P16473 | 4/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | PPARG | P37231 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | AHR | P35869 | 1/20 | 0.32 |
| ▸ | ERN1 | O75460 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10506532 | 0.87 | MAPT (0.40) | CA1CA2CA9ALDH1A1TSHR | |
| SCHEMBL10507310 | 0.81 | NMT1 (0.34) | KMT2AMAPTMEN1 | |
| SCHEMBL1547566 | 0.75 | KMT2A (0.38) | ALDH1A1TSHRHPGDKDM4EL3MBTL1 | |
| SCHEMBL95387 | 0.75 | CA1 (0.45) | CA1CA2CA9ALDH1A1TSHR | |
| SCHEMBL3390853 | 0.75 | CA1 (0.40) | CA1CA2CA9ALDH1A1TSHR | |
| SCHEMBL10507012 | 0.75 | CA1 (0.36) | CA1CA2CA9ALDH1A1TSHR | |
| SCHEMBL1547675 | 0.72 | TSHR (0.42) | TSHRCYP3A4MAPTAHRTP53 | |
| SCHEMBL9066864 | 0.72 | KMT2A (0.35) | CA1CA2CA9ALDH1A1TSHR | |
| SCHEMBL54507 | 0.70 | KMT2A (0.47) | CA1CA2CA9ALDH1A1TSHR | |
| SCHEMBL12680294 | 0.70 | CA1 (0.40) | CA1CA2CA9ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110122177-A1 | Ink Jet Recording Apparatus | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7896484-B2 | Ink jet recording apparatus | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-03-01 | — | — | US | disclosed |
| US-7666920-B2 | urable molding material an epoxy (meth)acrylate, acrylated polyethers;acrylated bisphenol, and a thermoplastic resin; shape recovering; shape retension; adhesion tosubstrate; high refractive index without a decrease in elastic modulus;Fresnel lens sheet | DAI NIPPON INK AND CHEMICALS, INC. (JP) | 2010-02-23 | — | — | US | disclosed |
| US-7473720-B2 | Photosensitive inkjet ink | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-01-06 | — | — | US | disclosed |
| US-20080273066-A1 | Ink jet recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-11-06 | — | — | US | disclosed |
| US-7417074-B2 | Ink for ink jet and ink jet recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-08-26 | — | — | US | disclosed |
| US-7375145-B2 | capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-05-20 | — | — | US | disclosed |
| EP-1528088-B1 | Inkjet ink | TOSHIBA TEC KK (JP) | 2008-02-27 | — | — | EP | disclosed |
| EP-1705230-B1 | Inkjet-ink | TOSHIBA TEC KK (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-20070270520-A1 | Capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound | RISO TECHNOLOGIES CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| EP-1528087-A2 | Ink for ink jet recording | Toshiba Tec Kabushiki Kaisha (JP) | 2005-05-04 | — | — | EP | disclosed |
| US-20050090580-A1 | Ink for ink jet recording | KABUSHIKI KAISHA TOSHIBA | 2005-04-28 | — | — | US | disclosed |
| US-20050057630-A1 | Ink for ink jet and ink jet recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2005-03-17 | — | — | US | disclosed |
| EP-1514911-A1 | Ink for ink jet and ink jet recording apparatus | Toshiba Tec Kabushiki Kaisha (JP) | 2005-03-16 | — | — | EP | disclosed |
| US-6809889-B2 | EPOXY (METH)ACRYLATE; (METH)ACRYLATE OF LOW MOLECULAR WEIGHT POLYOXYPROPYLENE; CYCLIC (METH)ACRYLATE (E.G., PHENOXYETHYL ACRYLATE) AND (METH)ACRYLATE OF TRIS(HYDROXYALKYL) ISOCYANURATE; HIGH ELASTIC MODULUS AND REFRACTIVE INDEX | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2004-10-26 | — | — | US | disclosed |
| US-20030113544-A1 | Radiation curable resin composition for fresnel lens and fresnel lens sheet | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2003-06-19 | — | — | US | disclosed |
| EP-1308471-A2 | Radiation curable resin composition for Fresnel lens and Fresnel lens sheet | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2003-05-07 | — | — | EP | disclosed |
| EP-0441383-B1 | Use of a copolymer for the making of contact lenses | MITSUBISHI RAYON CO (JP) | 1996-05-08 | — | — | EP | disclosed |
| US-5183870-A | A curable polybutylene glycol di(meth)acrylate, a urethane or epoxy (meth)acrylate and a (meth)acrylate; heat and water resistance; impact strength; dyeability; workability | MITSUBISHI RAYON CO., LTD (JP) | 1993-02-02 | — | — | US | disclosed |
| EP-0441383-A2 | Use of a copolymer for the making of contact lenses | MITSUBISHI RAYON CO., LTD. (JP) | 1991-08-14 | — | — | EP | disclosed |