SCHEMBL1764512

SCHEMBL1764512

CCC1(COC2CCC(OCC3(CC)COC3)CC2)COC1

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29276623 0.94 TSHR (0.30) TSHR
SCHEMBL522483 0.91 TSHR (0.32) TSHRMEN1KMT2A
SCHEMBL440173 0.90 NPC1 (0.32) TSHR
SCHEMBL4281908 0.88
SCHEMBL13301303 0.88
SCHEMBL521910 0.87
SCHEMBL21984934 0.86
SCHEMBL4841743 0.85
SCHEMBL1516363 0.83 EPHX1 (0.33) TSHR
SCHEMBL13183183 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110122177-A1 Ink Jet Recording Apparatus KABUSHIKI KAISHA TOSHIBA (JP) 2011-05-26 US disclosed
US-7896484-B2 Ink jet recording apparatus KABUSHIKI KAISHA TOSHIBA (JP) 2011-03-01 US disclosed
US-7500745-B2 Liquid ink and recording apparatus TOSHIBA TEC KABUSHIKI KAISHA (JP) 2009-03-10 US disclosed
US-7500745-B2 Liquid ink and recording apparatus TOSHIBA TEC KABUSHIKI KAISHA (JP) 2009-03-10 US disclosed
US-20080273066-A1 Ink jet recording apparatus TOSHIBA TEC KABUSHIKI KAISHA (JP) 2008-11-06 US disclosed
US-7417074-B2 Ink for ink jet and ink jet recording apparatus TOSHIBA TEC KABUSHIKI KAISHA (JP) 2008-08-26 US disclosed
US-7338737-B2 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-04 US disclosed
EP-1528087-B1 Ink for ink jet recording TOSHIBA TEC KK (JP) 2007-11-21 EP disclosed
US-7297452-B2 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-11-20 US disclosed
US-20070254221-A1 Akali-soluble resin, quinone diazide, surfactant mixture of a 3-perfluoroalkylpropane epoxide and polyethersilicones), and a solvent; high-quality display panels with uniformly-coated insulating layers. SAMSUNG DISPLAY CO., LTD. (KR) 2007-11-01 US disclosed
US-20060141393-A1 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. 2006-06-29 US disclosed
US-20060131267-A1 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG DISPLAY CO., LTD. (KR) 2006-06-22 US disclosed
EP-1514911-B1 Ink for ink jet and ink jet recording apparatus TOSHIBA TEC KK (JP) 2006-05-03 EP disclosed
EP-1528087-A2 Ink for ink jet recording Toshiba Tec Kabushiki Kaisha (JP) 2005-05-04 EP disclosed
US-20050090580-A1 Ink for ink jet recording KABUSHIKI KAISHA TOSHIBA 2005-04-28 US disclosed
US-20050057630-A1 Ink for ink jet and ink jet recording apparatus TOSHIBA TEC KABUSHIKI KAISHA (JP) 2005-03-17 US disclosed
EP-1514911-A1 Ink for ink jet and ink jet recording apparatus Toshiba Tec Kabushiki Kaisha (JP) 2005-03-16 EP disclosed