SCHEMBL521910

SCHEMBL521910

C=COC1CCC(OCC2(CC)COC2)CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1754780 0.90
SCHEMBL10090118 0.87
SCHEMBL1764512 0.87 TSHR (0.32)
SCHEMBL29276623 0.82 TSHR (0.30)
SCHEMBL13183299 0.79
SCHEMBL522483 0.79 TSHR (0.32)
SCHEMBL5028693 0.79 TSHR (0.32)
SCHEMBL440173 0.78 NPC1 (0.32)
SCHEMBL13301303 0.76
SCHEMBL4281908 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024158026-A1 PHOTOSENSITIVE COMPOSITION FOR FORMING HOLOGRAM LAYER 大日本印刷株式会社 2024-08-02 WO disclosed
US-9856340-B2 Photocurable fluorinated polymer composition ASAHI GLASS COMPANY, LIMITED (JP) 2018-01-02 US disclosed
EP-2799490-B1 PHOTOCURABLE FLUORINE-CONTAINING COPOLYMER COMPOSITION ASAHI GLASS CO LTD (JP) 2016-05-18 EP disclosed
US-8975349-B2 Cationically polymerizable resin composition and cured object obtained therefrom DAICEL CORPORATION (JP) 2015-03-10 US disclosed
US-8975349-B2 Cationically polymerizable resin composition and cured object obtained therefrom DAICEL CORPORATION (JP) 2015-03-10 US disclosed
US-8975349-B2 Cationically polymerizable resin composition and cured object obtained therefrom DAICEL CORPORATION (JP) 2015-03-10 US disclosed
EP-2468816-B1 PHOTOCURABLE FLUORINATED POLYMER COMPOSITION ASAHI GLASS CO LTD (JP) 2014-11-26 EP disclosed
EP-2799490-A1 PHOTOCURABLE FLUORINE-CONTAINING COPOLYMER COMPOSITION Asahi Glass Company, Limited (JP) 2014-11-05 EP disclosed
US-20140212673-A1 PHOTOCURABLE FLUORINATED COPOLYMER COMPOSITION ASAHI GLASS COMPANY, LIMITED (JP) 2014-07-31 US disclosed
US-8722801-B2 Process for producing hydrolyzable silyl group-containing fluoropolymer, and composition containing hydrolyzable silyl group-containing fluoropolymer ASAHI GLASS COMPANY, LIMITED (JP) 2014-05-13 US disclosed
US-7985866-B2 Oxetane-containing vinyl ether compound DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2011-07-26 US disclosed
US-7985866-B2 Oxetane-containing vinyl ether compound DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2011-07-26 US disclosed
US-7985866-B2 Oxetane-containing vinyl ether compound DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2011-07-26 US disclosed
EP-2233475-A1 Epoxycyclohexane vinyl ether compounds and their use in polymerizable compositions Daicel Chemical Industries, Ltd. (JP) 2010-09-29 EP disclosed
EP-2233475-A1 Epoxycyclohexane vinyl ether compounds and their use in polymerizable compositions Daicel Chemical Industries, Ltd. (JP) 2010-09-29 EP disclosed
US-20080234455-A1 Vinyl ether compounds and polymerizable compositions DAICEL CHEMICAL INDUSTRIES, LTD. 2008-09-25 US disclosed
US-20080234455-A1 Vinyl ether compounds and polymerizable compositions DAICEL CHEMICAL INDUSTRIES, LTD. 2008-09-25 US disclosed
US-20080234455-A1 Vinyl ether compounds and polymerizable compositions DAICEL CHEMICAL INDUSTRIES, LTD. 2008-09-25 US disclosed
EP-1972622-A2 Vinyl ether compounds and polymerizable compositions Daicel Chemical Industries, Ltd. (JP) 2008-09-24 EP disclosed
EP-1972622-A2 Vinyl ether compounds and polymerizable compositions Daicel Chemical Industries, Ltd. (JP) 2008-09-24 EP disclosed