SCHEMBL1764670

SCHEMBL1764670

Clc1cc(C(Cl)Cl)ccc1C(Cl)(Cl)Cl

nearest known ligand 0.56

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 5/20 0.56
▸ MAPK1 P28482 2/20 0.56
▸ TDP1 Q9NUW8 2/20 0.56
▸ CYP3A4 P08684 1/20 0.56
▸ ALDH1A1 P00352 1/20 0.32
▸ LMNA P02545 1/20 0.32
▸ TP53 P04637 1/20 0.32
▸ HPGD P15428 1/20 0.32
▸ HIF1A Q16665 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10969433 0.83 TSHR (0.40) TSHRMAPK1TDP1CYP3A4ALDH1A1
SCHEMBL10969541 0.77 TSHR (0.34) TSHRMAPK1TDP1CYP3A4
SCHEMBL10972079 0.77 TSHR (0.34) TSHRMAPK1TDP1CYP3A4
SCHEMBL28326049 0.74 AHR (0.52) TSHRCYP3A4ALDH1A1LMNATP53
P-Cymene SCHEMBL186659 0.74 CYP3A4 (0.46) TSHRMAPK1TDP1CYP3A4ALDH1A1
SCHEMBL10973912 0.72 TSHR (0.34) TSHRMAPK1TDP1CYP3A4LMNA
SCHEMBL1845000 0.72 TSHR (1.00) TSHRMAPK1TDP1CYP3A4ALDH1A1
SCHEMBL29402968 0.72 TSHR (1.00) TSHRMAPK1TDP1CYP3A4ALDH1A1
SCHEMBL11700964 0.71 TSHR (0.38) TSHRMAPK1TDP1CYP3A4LMNA
SCHEMBL8425257 0.70 TSHR (0.65) TSHRMAPK1TDP1CYP3A4LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 279 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4588906-A1 METHOD FOR PRODUCING TEREPHTHALOYL CHLORIDE BY CONTROLLING LIGHT AMOUNT Aekyung Chemical Co., Ltd. (KR) 2025-07-23 — — EP claimed
CN-119894857-A Process for producing terephthaloyl chloride by controlling light quantity 爱敬化学株式会社 2025-04-25 — — CN claimed
WO-2025058101-A1 METHOD FOR PREPARING TEREPHTHALOYL CHLORIDE THROUGH TEMPERATURE CONTROL 애경케미칼 주식회사 2025-03-20 — — WO claimed
CN-119284841-A Method for preparing insoluble sulfur from crude sulfur 武汉科技大学 2025-01-10 — — CN claimed
EP-3883978-B1 METHOD FOR PREPARING RANDOM LOW VINYL COPOLYMERS, COPOLYMERS PREPARED BY THIS METHOD, AND RUBBER MIXTURES BASED ON THESE COPOLYMERS SIBUR HOLDING PUBLIC JOINT STOCK CO (RU) 2023-07-19 — — EP claimed
CN-115304748-B Preparation method of porous polymer material 沈阳师范大学 2023-06-23 — — CN claimed
CN-115304748-A Preparation method of porous polymer material 沈阳师范大学 2022-11-08 — — CN claimed
CN-113247866-B Method and equipment for extracting insoluble sulfur 山东阳谷华泰化工股份有限公司 2022-08-26 — — CN claimed
CN-113956016-A Nano-permeation crystallization self-healing inorganic waterproof material on back water surface and preparation method thereof 朱耀台 2022-01-21 — — CN claimed
CN-113648686-A Defoaming agent for oil exploitation and processing system and processing method thereof 哈尔滨艾拓普科技有限公司 2021-11-16 — — CN claimed
EP-0521826-B1 Process for the production of electroconductive layers CIBA GEIGY AG (CH) 1995-06-07 — — EP claimed
US-5348762-A Process for the production of conductive layers CIBA-GEIGY CORPORATION (US) 1994-09-20 — — US claimed
EP-0521826-A1 Process for the production of electroconductive layers CIBA-GEIGY AG (CH) 1993-01-07 — — EP claimed
EP-0285564-B1 ANTISTATIC AND ELECTRICALLY CONDUCTIVE POLYMERS AND MOULDING COMPOSITIONS CIBA-GEIGY AG (CH) 1992-04-15 — — EP claimed
US-5009812-A Forming charge transfer complexes CIBA-GEIGY CORPORATION (US) 1991-04-23 — — US claimed
EP-0362143-A2 Antistatic and electrically conductive relief images, process for manufacturing the same, coating material and radiation-sensitive polymers CIBA-GEIGY AG (CH) 1990-04-04 — — EP claimed
CN-88101671-A Antistatic and conduct electricity polymkeric substance and moulding material — 1988-10-19 — — CN claimed
EP-0285564-A1 Antistatic and electrically conductive polymers and moulding compositions CIBA-GEIGY AG (CH) 1988-10-05 — — EP claimed
US-4500608-A ACRYLIC ESTER, HALOGEN INITIATOR, SECOND INITIATOR, AND POLYMERIZATION INHIBITOR MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1985-02-19 — — US claimed
EP-0132868-A1 Alpha-halogenated aromatic compounds as photoinitiators STAUFFER CHEMICAL COMPANY (US) 1985-02-13 — — EP claimed
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