SCHEMBL176493

SCHEMBL176493

C=CCN(S)C(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15265892 0.77
SCHEMBL2790089 0.77
SCHEMBL11568655 0.75
SCHEMBL87611 0.75
SCHEMBL16166598 0.75
SCHEMBL569861 0.74 ALDH1A1 (0.52)
SCHEMBL3652188 0.74 ALDH1A1 (0.52)
SCHEMBL17209104 0.74 ALDH1A1 (0.41)
SCHEMBL4243340 0.72
SCHEMBL170266 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115605635-A Silver/tin electroplating bath and method of use 麦克德米德乐思公司(US) 2023-01-13 CN claimed
US-10772822-B2 Molecularly imprinted polymers and their use as antidandruff agents L'OREAL (FR) 2020-09-15 US claimed
EP-2938641-B1 MOLECULARLY IMPRINTED POLYMERS AND THEIR USE AS ANTIDANDRUFF AGENTS ORÉAL L (FR) 2016-08-24 EP claimed
US-20150342859-A1 MOLECULARLY IMPRINTED POLYMERS AND THEIR USE AS ANTIDANDRUFF AGENTS L'OREAL (FR) 2015-12-03 US claimed
EP-2938641-A1 MOLECULARLY IMPRINTED POLYMERS AND THEIR USE AS ANTIDANDRUFF AGENTS L'Oréal (FR) 2015-11-04 EP claimed
EP-2242802-B1 HYDROLYSIS-RESISTANT POLYAMIDE-ELASTOMER MIXTURES, MOLDED PARTS PRODUCED THEREFROM AND USE THEREOF EMS PATENT AG (CH) 2015-10-07 EP claimed
WO-2014102206-A1 MOLECULARLY IMPRINTED POLYMERS AND THEIR USE AS ANTIDANDRUFF AGENTS L'OREAL (FR) 2014-07-03 WO claimed
EP-1946362-B1 TIN-SILVER SOLDER BUMPING IN ELECTRONICS MANUFACTURE ENTHONE (US) 2012-01-11 EP claimed
US-20110229672-A1 Hydrolysis-resistant polyamide-elastomer mixtures, molded articles produced therefrom and their use RHEIN CHEMIE RHEINAU GMBH (DE) 2011-09-22 US claimed
US-7713859-B2 Tin-silver solder bumping in electronics manufacture ENTHONE INC. (US) 2010-05-11 US claimed
JP-2009510255-A 2009-03-12 JP claimed
EP-1946362-A2 TIN-SILVER SOLDER BUMPING IN ELECTRONICS MANUFACTURE ENTHONE, INCORPORATED (US) 2008-07-23 EP claimed
WO-2007022075-A2 TIN-SILVER SOLDER BUMPING IN ELECTRONICS MANUFACTURE ENTHONE INC. (US) 2007-02-22 WO claimed
US-20070037377-A1 TIN-SILVER SOLDER BUMPING IN ELECTRONICS MANUFACTURE ENTHONE INC. (US) 2007-02-15 US claimed
CN-1171561-A Optical unit and electrolytic solution SONY CORP (JP) 1998-01-28 CN claimed
EP-0554275-B1 ACID BATH FOR COPPER PLATING, AND A PROCESS USING A BATH OF THIS TYPE FOR THIS PURPOSE ATOTECH DEUTSCHLAND GMBH (DE) 1994-12-14 EP claimed
US-3976812-A Photoconductive cells EASTMAN KODAK COMPANY (US) 1976-08-24 US claimed
JP-63014734-A None JP disclosed
US-3976812-A Photoconductive cells EASTMAN KODAK COMPANY (US) 1976-08-24 US disclosed
US-3976812-A Photoconductive cells EASTMAN KODAK COMPANY (US) 1976-08-24 US disclosed