Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 1/20 | 0.30 |
| ▸ | LCK | P06239 | 1/20 | 0.30 |
| ▸ | FYN | P06241 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16736483 | 0.91 | — | — | |
| Acetic Acid SCHEMBL783968 | 0.72 | FFAR3 (0.37) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL9240467 | 0.72 | FFAR3 (0.37) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL10866192 | 0.71 | FFAR3 (0.32) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL19834918 | 0.70 | FFAR3 (0.35) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL5083333 | 0.68 | FFAR3 (0.33) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL10538981 | 0.68 | TP53 (0.33) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL7858874 | 0.67 | TP53 (0.32) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL9223254 | 0.67 | FFAR3 (0.32) | FFAR3LCKFYN | |
| SCHEMBL9852788 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8815206-B2 | Aluminum hydroxide gel particle and production method thereof | KYOWA CHEMICAL INDUSTRY CO., LTD. (JP) | 2014-08-26 | — | — | US | disclosed |
| EP-2319803-B1 | ALUMINUM HYDROXIDE GEL PARTICLES AND PROCESS FOR PRODUCTION OF SAME | KYOWA CHEM IND CO LTD (JP) | 2013-10-09 | — | — | EP | disclosed |
| US-8524192-B2 | Aluminum hydroxide gel particle and production method thereof | KYOWA CHEMICAL INDUSTRY CO., LTD. (JP) | 2013-09-03 | — | — | US | disclosed |
| US-20130145965-A1 | ALUMINUM HYDROXIDE GEL PARTICLE AND PRODUCTION METHOD THEREOF | KYOWA CHEMICAL INDUSTRY CO., LTD. (JP) | 2013-06-13 | — | — | US | disclosed |
| US-20110142749-A1 | ALUMINUM HYDROXIDE GEL PARTICLE AND PRODUCTION METHOD THEREOF | KYOWA CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| EP-2319803-A1 | ALUMINUM HYDROXIDE GEL PARTICLES AND PROCESS FOR PRODUCTION OF SAME | KYOWA CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-05-11 | — | — | EP | disclosed |
| US-20080237535-A1 | Composition for polishing semiconductor wafer, and method of producing the same | SPEEDFAM CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |