SCHEMBL17675339

SCHEMBL17675339

O=C(CCCCC(=O)OC1CCCC1)OC1CCCC1

nearest known ligand 0.78

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.78
SMN1; SMN2 Q16637 2/20 0.58
CYP2C19 P33261 1/20 0.50
HTT P42858 1/20 0.47
CYP19A1 P11511 2/20 0.46
EPHX1 P07099 2/20 0.44
ALDH1A1 P00352 2/20 0.40
KDM4E B2RXH2 1/20 0.40
LMNA P02545 1/20 0.40
HPGD P15428 1/20 0.40
TSHR P16473 1/20 0.39
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA9 Q16790 1/20 0.38
EPHX2 P34913 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17675641 0.98 NAAA (0.79) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL31069915 0.98 NAAA (0.81) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL207867 0.98 NAAA (0.79) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL525240 0.96 NAAA (0.82) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL1681692 0.96 NAAA (0.82) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL9490272 0.96 NAAA (0.82) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL15987690 0.96 NAAA (0.82) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL31069919 0.96 NAAA (0.82) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL9488891 0.96 NAAA (0.82) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL1980866 0.95 NAAA (0.71) NAAASMN1; SMN2CYP2C19HTTCYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024225072-A1 PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR CURED RELIEF PATTERN, AND CURED FILM 旭化成株式会社 2024-10-31 WO disclosed
WO-2024210063-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN, CURED FILM, AND SEMICONDUCTOR DEVICE 旭化成株式会社 2024-10-10 WO disclosed
CN-114716591-A Catalyst component for propylene polymerization, preparation method and application thereof 任丘市利和科技发展有限公司 2022-07-08 CN disclosed
US-10550242-B2 Plasticiser composition containing aliphatic dicarboxylic acid esters and diesters selected from 1,2-cyclohexane dicarboxylic acid esters and terephthalic acid esters BASF SE (DE) 2020-02-04 US disclosed
EP-3405518-B1 PLASTICISER COMPOSITION CONTAINING ALIPHATIC DICARBOXYLIC ACID ESTERS AND DIESTERS SELECTED FROM 1,2-CYCLOHEXANE DICARBOXYLIC ACID ESTERS AND TEREPHTHALIC ACID ESTERS BASF SE (DE) 2019-11-06 EP disclosed
US-10329402-B2 Plasticizer composition which comprises cycloalkyl esters of saturated dicarboxylic acids and 1,2-cyclohexanedicarboxylic esters BASF SE (DE) 2019-06-25 US disclosed
US-10287415-B2 Plasticizer composition which comprises cycloalkyl esters of saturated dicarboxylic acids and terephthalic esters BASF SE (DE) 2019-05-14 US disclosed
EP-3405518-A1 PLASTICISER COMPOSITION CONTAINING ALIPHATIC DICARBOXYLIC ACID ESTERS AND DIESTERS SELECTED FROM 1,2-CYCLOHEXANE DICARBOXYLIC ACID ESTERS AND TEREPHTHALIC ACID ESTERS BASF SE (DE) 2018-11-28 EP disclosed
EP-3204448-B1 PLASTICIZER COMPOSITION WHICH COMPRISES CYCLOALKYL ESTERS OF SATURATED DICARBOXYLIC ACIDS AND 1,2-CYCLOHEXANEDICARBOXYLIC ESTERS BASF SE (DE) 2018-10-03 EP disclosed
EP-3204447-B1 PLASTICIZER COMPOSITION WHICH COMPRISES CYCLOALKYL ESTERS OF SATURATED DICARBOXYLIC ACIDS AND TEREPHTHALIC ESTERS BASF SE (DE) 2018-07-18 EP disclosed
US-20170313850-A1 PLASTICIZER COMPOSITION WHICH COMPRISES CYCLOALKYL ESTERS OF SATURATED DICARBOXYLIC ACIDS AND 1,2-CYCLOHEXANEDICARBOXYLIC ESTERS BASF SE (DE) 2017-11-02 US disclosed
US-20170313848-A1 PLASTICIZER COMPOSITION WHICH COMPRISES CYCLOALKYL ESTERS OF SATURATED DICARBOXYLIC ACIDS AND TEREPHTHALIC ESTERS BASF SE (DE) 2017-11-02 US disclosed
EP-3204448-A1 PLASTICIZER COMPOSITION WHICH COMPRISES CYCLOALKYL ESTERS OF SATURATED DICARBOXYLIC ACIDS AND 1,2-CYCLOHEXANEDICARBOXYLIC ESTERS BASF SE (DE) 2017-08-16 EP disclosed
EP-3204447-A1 PLASTICIZER COMPOSITION WHICH COMPRISES CYCLOALKYL ESTERS OF SATURATED DICARBOXYLIC ACIDS AND TEREPHTHALIC ESTERS BASF SE (DE) 2017-08-16 EP disclosed
WO-2017125458-A1 PLASTICISER COMPOSITION CONTAINING ALIPHATIC DICARBOXYLIC ACID ESTERS AND DIESTERS SELECTED FROM 1,2-CYCLOHEXANE DICARBOXYLIC ACID ESTERS AND TEREPHTHALIC ACID ESTERS BASF SE (DE) 2017-07-27 WO disclosed
WO-2016055573-A1 PLASTICIZER COMPOSITION WHICH COMPRISES CYCLOALKYL ESTERS OF SATURATED DICARBOXYLIC ACIDS AND 1,2-CYCLOHEXANEDICARBOXYLIC ESTERS BASF SE (DE) 2016-04-14 WO disclosed
WO-2016055572-A1 PLASTICIZER COMPOSITION WHICH COMPRISES CYCLOALKYL ESTERS OF SATURATED DICARBOXYLIC ACIDS AND TEREPHTHALIC ESTERS BASF SE (DE) 2016-04-14 WO disclosed