Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.44 |
| ▸ | ADH1B | P00325 | 1/20 | 0.41 |
| ▸ | ADH1C | P00326 | 1/20 | 0.41 |
| ▸ | ADH1A | P07327 | 1/20 | 0.41 |
| ▸ | ADH4 | P08319 | 1/20 | 0.41 |
| ▸ | ADH7 | P40394 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.37 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.37 |
| ▸ | FDPS | P14324 | 3/20 | 0.35 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.35 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3730755 | 0.98 | ACE2 (0.41) | ACE2ADH1BADH1CADH1AADH4 | |
| SCHEMBL28127586 | 0.92 | ACE2 (0.34) | ACE2ADH1BADH1CADH1AADH4 | |
| SCHEMBL28093107 | 0.85 | LMNA (0.36) | LMNA | |
| SCHEMBL7555491 | 0.84 | LMNA (0.30) | LMNA | |
| SCHEMBL2148105 | 0.84 | LMNA (0.30) | LMNA | |
| SCHEMBL2012541 | 0.84 | LMNA (0.30) | LMNA | |
| SCHEMBL14525949 | 0.83 | — | — | |
| SCHEMBL11615998 | 0.82 | ACE2 (0.47) | ACE2ADH1BADH1CADH1AADH4 | |
| SCHEMBL28150593 | 0.82 | ACE2 (0.32) | ACE2 | |
| SCHEMBL7703603 | 0.82 | LMNA (0.31) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4021962-A1 | IN-MOLD COMPOSITE SURFACING FILM | Akzo Nobel Coatings International B.V. (NL) | 2022-07-06 | — | — | EP | disclosed |
| WO-2021037889-A1 | IN-MOLD COMPOSITE SURFACING FILM | AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) | 2021-03-04 | — | — | WO | disclosed |
| WO-2020227296-A1 | THERMALLY REVERSIBLE AND REORGANIZABLE CROSSLINKING POLYMERS FOR VOLUME BRAGG GRATINGS | FACEBOOK TECHNOLOGIES, LLC (US) | 2020-11-12 | — | — | WO | disclosed |
| EP-3732224-A1 | AQUEOUS DISPERSION | Covestro Deutschland AG (DE) | 2020-11-04 | — | — | EP | disclosed |
| US-10606212-B2 | Selection method for additives in photopolymers | COVESTRO DEUTSCHLAND AG (DE) | 2020-03-31 | — | — | US | disclosed |
| US-20170199494-A1 | SELECTION METHOD FOR ADDITIVES IN PHOTOPOLYMERS | COVESTRO DEUTSCHLAND AG (DE) | 2017-07-13 | — | — | US | disclosed |
| CN-102762340-B | Polishing pad and manufacture method thereof | 3M INNOVATIVE PROPERTIES CO. (US) | 2016-12-14 | — | — | CN | disclosed |
| US-9440326-B2 | Non-planar glass polishing pad and method of manufacture | JH RHODES COMPANY, INC. (US) | 2016-09-13 | — | — | US | disclosed |
| US-9050697-B2 | Self-conditioning polishing pad and a method of making the same | JH RHODES COMPANY, INC. (US) | 2015-06-09 | — | — | US | disclosed |
| CN-104661794-A | Non-planar glass polishing pad and method of manufacture | J H RHODES INC | 2015-05-27 | — | — | CN | disclosed |
| US-20130252519-A1 | SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME | JH RHODES COMPANY, INC. (US) | 2013-09-26 | — | — | US | disclosed |
| WO-2013079422-A1 | HOLOGRAPHIC MEDIUM HAVING A PROTECTIVE LAYER | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2013-06-06 | — | — | WO | disclosed |
| WO-2012138705-A2 | A SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME | UNIVERSAL PHOTONICS, INC. (US) | 2012-10-11 | — | — | WO | disclosed |
| US-20120237856-A1 | SELECTION METHOD FOR ADDITIVES IN PHOTOPOLYMERS | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2012-09-20 | — | — | US | disclosed |
| US-20120231377-A1 | PHOTOPOLYMER FORMULATION HAVING DIFFERENT WRITING COMONOMERS | COVESTRO DEUTSCHLAND AG (DE) | 2012-09-13 | — | — | US | disclosed |
| EP-2497082-A1 | FLUOROURETHANE AS AN ADDITIVE IN A PHOTOPOLYMER FORMULATION | Bayer MaterialScience AG (DE) | 2012-09-12 | — | — | EP | disclosed |
| WO-2011054795-A1 | FLUOROURETHANE AS AN ADDITIVE IN A PHOTOPOLYMER FORMULATION | BAYER MATERIALSCIENCE AG (DE) | 2011-05-12 | — | — | WO | disclosed |
| EP-2218743-A1 | Prepolymer-based polyurethane formulations for producing holographic films | Bayer MaterialScience AG (DE) | 2010-08-18 | — | — | EP | disclosed |
| US-20080146129-A1 | Fast break-in polishing pad and a method of making the same | KOUZUMA MAKOTO | 2008-06-19 | — | — | US | disclosed |
| WO-2006049656-A1 | POLYURETHANE UREA POLISHING PAD | PPG INDUSTRIES OHIO, INC. (US) | 2006-05-11 | — | — | WO | disclosed |