Sulfuric Acid

Sulfuric Acid

SCHEMBL17707276

CCCCCCCCCCCCCCCCCCOCCCCCCCCCCCCCCCCCC.CCCCCCCCCCCCCCCCCCOCCCCCCCCCCCCCCCCCC.O=S(=O)([O-])[O-].[Na+].[Na+]

nearest known ligand 0.65

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RECQL P46063 2/20 0.65
▸ TSHR P16473 2/20 0.65
▸ GLA P06280 1/20 0.65
▸ HPGD P15428 1/20 0.65
▸ MAPK1 P28482 1/20 0.65
▸ EPHX2 P34913 1/20 0.65
▸ BLM P54132 1/20 0.65
▸ MEN1 O00255 1/20 0.52
▸ THRB P10828 1/20 0.52
▸ HTT P42858 1/20 0.52
▸ KMT2A Q03164 1/20 0.52
▸ MAPT P10636 1/20 0.52
▸ CA1 P00915 9/20 0.50
▸ CA2 P00918 9/20 0.50
▸ CA9 Q16790 8/20 0.50
▸ CA12 O43570 3/20 0.50
▸ CA7 P43166 3/20 0.50
▸ CA14 Q9ULX7 3/20 0.50
▸ CA3 P07451 2/20 0.50
▸ CA4 P22748 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL324782 1.00 RECQL (0.65) RECQLTSHRGLAHPGDMAPK1
Sulfuric Acid SCHEMBL15284 1.00 RECQL (0.65) RECQLTSHRGLAHPGDMAPK1
Sulfuric Acid SCHEMBL9771955 1.00 RECQL (0.65) RECQLTSHRGLAHPGDMAPK1
Sulfuric Acid SCHEMBL11022898 1.00 RECQL (0.65) RECQLTSHRGLAHPGDMAPK1
Sulfuric Acid SCHEMBL497579 1.00 RECQL (0.65) RECQLTSHRGLAHPGDMAPK1
Sulfuric Acid SCHEMBL7537885 1.00 RECQL (0.65) RECQLTSHRGLAHPGDMAPK1
Sulfuric Acid SCHEMBL7537833 1.00 RECQL (0.65) RECQLTSHRGLAHPGDMAPK1
Sulfuric Acid SCHEMBL16005551 1.00 RECQL (0.65) RECQLTSHRGLAHPGDMAPK1
Sulfuric Acid SCHEMBL10339771 1.00 RECQL (0.65) RECQLTSHRGLAHPGDMAPK1
Sulfuric Acid SCHEMBL1978127 1.00 RECQL (0.65) RECQLTSHRGLAHPGDMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4536395-A1 CLAY COMPOSITE SUPPORT-ACTIVATORS AND CATALYST COMPOSITIONS Formosa Plastics Corporation, U.S.A. (US) 2025-04-16 — — EP disclosed
US-20230399420-A1 CLAY COMPOSITE SUPPORT-ACTIVATORS AND CATALYST COMPOSITIONS FORMOSA PLASTICS CORPORATION, U.S.A. (US) 2023-12-14 — — US disclosed
WO-2023239560-A1 CLAY COMPOSITE SUPPORT-ACTIVATORS AND CATALYST COMPOSITIONS FORMOSA PLASTICS CORPORATON, U.S.A. (US) 2023-12-14 — — WO disclosed
CN-115475106-A Spray hair colorant compositions 朋友株式会社 2022-12-16 — — CN disclosed
CN-109195573-B Oxidation hair dye composition 朋友株式会社 2022-12-13 — — CN disclosed
EP-3015099-B1 HAIR COSMETIC MATERIAL, AND HAIR COSMETIC PRODUCT HOYU KK (JP) 2020-06-17 — — EP disclosed
CN-109689765-A Crystal nucleating agent for polyolefin resin, method for producing crystal nucleating agent for polyolefin resin, and method for improving fluidity of crystal nucleating agent for polyolefin resin 新日本理化株式会社 2019-04-26 — — CN disclosed
US-20190038524-A1 HAIR COSMETIC MATERIAL COMPOSITION AND OXIDIZING AGENT-CONTAINING COMPOSITION THEREOF, HAIR COSMETIC MATERIAL, AND HAIR COSMETIC PRODUCT HOYU CO., LTD. 2019-02-07 — — US disclosed
US-20190038525-A1 HAIR COSMETIC MATERIAL COMPOSITION AND OXIDIZING AGENT-CONTAINING COMPOSITION THEREOF, HAIR COSMETIC MATERIAL, AND HAIR COSMETIC PRODUCT HOYU CO., LTD. 2019-02-07 — — US disclosed
US-20190038523-A1 HAIR COSMETIC MATERIAL COMPOSITION AND OXIDIZING AGENT-CONTAINING COMPOSITION THEREOF, HAIR COSMETIC MATERIAL, AND HAIR COSMETIC PRODUCT HOYU CO., LTD. 2019-02-07 — — US disclosed
CN-105838143-A Ink set and image forming method 富士胶片株式会社 2016-08-10 — — CN disclosed
US-20160128915-A1 HAIR COSMETIC MATERIAL COMPOSITION AND OXIDIZING AGENT-CONTAINING COMPOSITION THEREOF, HAIR COSMETIC MATERIAL, AND HAIR COSMETIC PRODUCT HOYU CO., LTD. (JP) 2016-05-12 — — US disclosed
EP-3015099-A1 HAIR COSMETIC MATERIAL COMPOSITION AND OXIDE-CONTAINING COMPOSITION THEREOF, HAIR COSMETIC MATERIAL, AND HAIR COSMETIC PRODUCT Hoyu Co., Ltd. (JP) 2016-05-04 — — EP disclosed
CN-1092691-C Aqueous dispersions of organopolysiloxanes WACKER CHEMIE GMBH (DE) 2002-10-16 — — CN disclosed
CN-1183112-A Aqueous dispersions of organopolysiloxanes WACKER CHEMIE GMBH (DE) 1998-05-27 — — CN disclosed
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