Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 2/20 | 0.65 |
| ▸ | TSHR | P16473 | 2/20 | 0.65 |
| ▸ | GLA | P06280 | 1/20 | 0.65 |
| ▸ | HPGD | P15428 | 1/20 | 0.65 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.65 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.65 |
| ▸ | BLM | P54132 | 1/20 | 0.65 |
| ▸ | MEN1 | O00255 | 1/20 | 0.52 |
| ▸ | THRB | P10828 | 1/20 | 0.52 |
| ▸ | HTT | P42858 | 1/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.52 |
| ▸ | CA1 | P00915 | 9/20 | 0.50 |
| ▸ | CA2 | P00918 | 9/20 | 0.50 |
| ▸ | CA9 | Q16790 | 8/20 | 0.50 |
| ▸ | CA12 | O43570 | 3/20 | 0.50 |
| ▸ | CA7 | P43166 | 3/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.50 |
| ▸ | CA3 | P07451 | 2/20 | 0.50 |
| ▸ | CA4 | P22748 | 2/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL324782 | 1.00 | RECQL (0.65) | RECQLTSHRGLAHPGDMAPK1 | |
| Sulfuric Acid SCHEMBL497579 | 1.00 | RECQL (0.65) | RECQLTSHRGLAHPGDMAPK1 | |
| Sulfuric Acid SCHEMBL11022898 | 1.00 | RECQL (0.65) | RECQLTSHRGLAHPGDMAPK1 | |
| Sulfuric Acid SCHEMBL15284 | 1.00 | RECQL (0.65) | RECQLTSHRGLAHPGDMAPK1 | |
| Sulfuric Acid SCHEMBL9771955 | 1.00 | RECQL (0.65) | RECQLTSHRGLAHPGDMAPK1 | |
| Sulfuric Acid SCHEMBL17707276 | 1.00 | RECQL (0.65) | RECQLTSHRGLAHPGDMAPK1 | |
| Sulfuric Acid SCHEMBL16005551 | 1.00 | RECQL (0.65) | RECQLTSHRGLAHPGDMAPK1 | |
| Sulfuric Acid SCHEMBL7537833 | 1.00 | RECQL (0.65) | RECQLTSHRGLAHPGDMAPK1 | |
| Sulfuric Acid SCHEMBL10339771 | 1.00 | RECQL (0.65) | RECQLTSHRGLAHPGDMAPK1 | |
| Sulfuric Acid SCHEMBL7537885 | 1.00 | RECQL (0.65) | RECQLTSHRGLAHPGDMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114349143-B | Complex coacervate phase system and preparation method and application thereof | 扬州大学 | 2023-04-14 | — | — | CN | claimed |
| CN-114349143-A | Complex coacervate phase system and preparation method and application thereof | 扬州大学 | 2022-04-15 | — | — | CN | claimed |
| CN-111134122-B | Efficient spreading agent for promoting water drops to impact on super-hydrophobic surface and completely spread | 中国科学院化学研究所 | 2021-07-27 | — | — | CN | claimed |
| CN-111658781-A | Mesoscale solubilization functional active compound system and preparation method and application thereof | 中国科学院化学研究所 | 2020-09-15 | — | — | CN | claimed |
| CN-111134122-A | Efficient spreading agent for promoting water drops to impact on super-hydrophobic surface and completely spread | 中国科学院化学研究所 | 2020-05-12 | — | — | CN | claimed |
| US-9044624-B2 | Sunscreen composition | SHISEIDO COMPANY, LTD. (JP) | 2015-06-02 | — | — | US | claimed |
| US-20120321576-A1 | SUNSCREEN COMPOSITION | SHISEIDO COMPANY, LTD. (JP) | 2012-12-20 | — | — | US | claimed |
| US-20120189956-A1 | SOLVENT-FREE TONER PROCESSES | XEROX CORPORATION (US) | 2012-07-26 | — | — | US | claimed |
| CN-118715596-A | Composition, and method for manufacturing and etching semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2024-09-27 | — | — | CN | disclosed |
| WO-2024120986-A1 | A TRANSPARENT LIQUID CLEANSING COMPOSITION | UNILEVER IP HOLDINGS B.V. (NL) | 2024-06-13 | — | — | WO | disclosed |
| EP-4356896-A1 | COMPOSITION COMPRISING SURFACTANT PREPARED WITH CARBON FROM CARBON CAPTURE | Unilever IP Holdings B.V. (NL) | 2024-04-24 | — | — | EP | disclosed |
| WO-2024041888-A1 | A SKIN CLEANSING COMPOSITION | UNILEVER IP HOLDINGS B.V. (NL) | 2024-02-29 | — | — | WO | disclosed |
| WO-2024028132-A1 | A LIQUID CLEANSING COMPOSITION | UNILEVER IP HOLDINGS B.V. (NL) | 2024-02-08 | — | — | WO | disclosed |
| WO-2023174769-A1 | A CLEANSING COMPOSITION | UNILEVER IP HOLDINGS B.V. (NL) | 2023-09-21 | — | — | WO | disclosed |
| US-20040136942-A1 | Skin cleansing composition | KAO CORPORATION (JP) | 2004-07-15 | — | — | US | disclosed |
| CN-1478462-A | Composition of skin cleanser | 花王株式会社 | 2004-03-03 | — | — | CN | disclosed |
| EP-1384470-A1 | Skin cleansing composition | KAO CORPORATION (JP) | 2004-01-28 | — | — | EP | disclosed |
| CN-1420742-A | Personal care articles | PROCTER & GAMBLE (US) | 2003-05-28 | — | — | CN | disclosed |
| CN-1399524-A | Personal care article comprising cotton layer | PROCTER & GAMBLE (US) | 2003-02-26 | — | — | CN | disclosed |
| US-4992107-A | Mixing neutralized acid amionic surfactant slurry and molten mixture of mono- and diethanolamides to constant viscosity, heating to deaerate | PARK CORPORATION (US) | 1991-02-12 | — | — | US | disclosed |