⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL52183 | 0.79 | — | — | |
| SCHEMBL4241480 | 0.75 | — | — | |
| SCHEMBL19810598 | 0.73 | — | — | |
| SCHEMBL323063 | 0.73 | — | — | |
| SCHEMBL8817076 | 0.73 | — | — | |
| SCHEMBL248018 | 0.71 | — | — | |
| SCHEMBL60502 | 0.71 | — | — | |
| SCHEMBL3681282 | 0.71 | — | — | |
| SCHEMBL2490733 | 0.71 | — | — | |
| SCHEMBL23351117 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8889888-B2 | Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| EP-1697311-B1 | NITRILE COMPOUND AND ITS USE IN PEST CONTROL | SUMITOMO CHEMICAL CO (JP) | 2011-10-26 | — | — | EP | disclosed |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-7897821-B2 | Sulfonium compound | JSR CORPORATION (JP) | 2011-03-01 | — | — | US | disclosed |
| US-20100324329-A1 | COMPOUND | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-7812105-B2 | Compound, polymer, and radiation-sensitive composition | JSR CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-7662402-B2 | contains fluoroalkyl group; insecticides, miticides, nematocides | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-02-16 | — | — | US | disclosed |
| US-20090069521-A1 | Novel Compound, Polymer, and Radiation-Sensitive Composition | JSR CORPORATION (JP) | 2009-03-12 | — | — | US | disclosed |
| CN-100390140-C | Nitrile compounds and their use in pest control | SUMITOMO CHEMICAL CO (JP) | 2008-05-28 | — | — | CN | disclosed |
| US-20070112068-A1 | Nitrile compound and its use in pest control | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-05-17 | — | — | US | disclosed |
| CN-1898200-A | Nitrile compound and its pest control use | SUMITOMO CHEMICAL CO (JP) | 2007-01-17 | — | — | CN | disclosed |
| EP-1697311-A1 | NITRILE COMPOUND AND ITS USE IN PEST CONTROL | Sumitomo Chemical Company, Limited (JP) | 2006-09-06 | — | — | EP | disclosed |
| WO-2005063694-A1 | NITRILE COMPOUND AND ITS USE IN PEST CONTROL | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-07-14 | — | — | WO | disclosed |