⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL386032 | 0.76 | — | — | |
| SCHEMBL370548 | 0.72 | — | — | |
| SCHEMBL1021062 | 0.72 | — | — | |
| SCHEMBL246920 | 0.71 | — | — | |
| SCHEMBL1018060 | 0.71 | — | — | |
| SCHEMBL1773377 | 0.71 | — | — | |
| SCHEMBL9854322 | 0.71 | LMNA (0.32) | — | |
| SCHEMBL4241480 | 0.71 | — | — | |
| SCHEMBL27811066 | 0.71 | — | — | |
| SCHEMBL17495204 | 0.69 | LMNA (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250110101-A1 | PER AND POLYFLUOROALKYL SUBSTANCE MEASUREMENT | DEXSIL CORPORATION (US) | 2025-04-03 | — | — | US | disclosed |
| US-20240059860-A1 | METHODS AND SYSTEMS FOR DESTRUCTION OF SYNTHETIC PER- AND POLYFLUORO COMPOUNDS | CHZ TECHNOLOGIES, LLC | 2024-02-22 | — | — | US | disclosed |
| CN-103553869-B | The preparation method of bromine fluorine butane | SANAIFU NEW MATERIAL CO., LTD., SHANGHAI (CN) | 2015-12-30 | — | — | CN | disclosed |
| US-9146470-B2 | Photoacid generator and photoresist comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-09-29 | — | — | US | disclosed |
| US-9024058-B2 | Ammonium fluoroalkanesulfonates and a synthesis method therefor | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20150056558-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-02-26 | — | — | US | disclosed |
| US-8900794-B2 | Photoacid generator and photoresist comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-12-02 | — | — | US | disclosed |
| US-8889335-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8877960-B2 | Fluoroalkanesulfonic acid ammonium salts and method for producing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-11-04 | — | — | US | disclosed |
| CN-103553869-A | Preparation method of bromo fluorobutane | SHANGHAI 3F NEW MATERIAL CO LTD | 2014-02-05 | — | — | CN | disclosed |
| EP-2155665-B1 | ORGANIC SULFUR COMPOUND AND ITS USE FOR CONTROLLING HARMFUL ARTHROPOD | SUMITOMO CHEMICAL CO (JP) | 2011-01-12 | — | — | EP | disclosed |
| US-20100152289-A1 | ORGANIC SULFUR COMPOUND AND ITS USE FOR CONTROLLING HARMFUL ARTHROPOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-06-17 | — | — | US | disclosed |
| US-7569324-B2 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-04 | — | — | US | disclosed |
| US-20080124656-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| EP-1309530-B1 | PROCESS FOR DEHYDROHALOGENATION OF HALOGENATED COMPOUNDS | DUPONT DOW ELASTOMERS LLC (US) | 2006-07-26 | — | — | EP | disclosed |
| EP-1309530-A2 | PROCESS FOR DEHYDROHALOGENATION OF HALOGENATED COMPOUNDS | DUPONT DOW ELASTOMERS L.L.C. (US) | 2003-05-14 | — | — | EP | disclosed |
| US-6380446-B1 | Process for dehydrohalogenation of halogenated compounds | DUPONT DOW ELASTOMERS, L.L.C. | 2002-04-30 | — | — | US | disclosed |
| WO-2002014247-A2 | PROCESS FOR DEHYDROHALOGENATION OF HALOGENATED COMPOUNDS | DUPONT DOW ELASTOMERS L.L.C. (US) | 2002-02-21 | — | — | WO | disclosed |
| US-20020022753-A1 | PROCESS FOR DEHYDROHALOGENATION OF HALOG ENATED COMPOUNDS | E. I. DU PONT DE NEMOURS AND COMPANY | 2002-02-21 | — | — | US | disclosed |