SCHEMBL17754170

SCHEMBL17754170

C=C(C)C(=O)OC(C(=O)OCCC12CC3CC(CC(C3)C1)C2)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 7/20 0.44
KMT2A Q03164 7/20 0.44
ALDH1A1 P00352 5/20 0.42
MAPT P10636 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
ATM Q13315 1/20 0.42
CA9 Q16790 2/20 0.39
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
CYP2D6 P10635 1/20 0.34
EPHX2 P34913 3/20 0.31
LMNA P02545 1/20 0.30
SCN9A Q15858 1/20 0.30
EGFR P00533 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17754171 0.93 MEN1 (0.37) MEN1KMT2AALDH1A1MAPTL3MBTL1
SCHEMBL17753869 0.88 ALDH1A1 (0.42) MEN1KMT2AALDH1A1MAPTL3MBTL1
SCHEMBL17752175 0.84 MEN1 (0.47) MEN1KMT2AALDH1A1MAPTL3MBTL1
SCHEMBL17778355 0.82 MAPT (0.36) MEN1KMT2AALDH1A1MAPTL3MBTL1
SCHEMBL17754186 0.82 ALDH1A1 (0.39) MEN1KMT2AALDH1A1L3MBTL1CA9
SCHEMBL5001405 0.80 MEN1 (0.56) MEN1KMT2AALDH1A1MAPTL3MBTL1
SCHEMBL17778353 0.80 CYP17A1 (0.38) MEN1KMT2AALDH1A1MAPTATM
SCHEMBL17753844 0.80
SCHEMBL17754185 0.79 ALDH1A1 (0.32) MEN1KMT2AALDH1A1L3MBTL1
SCHEMBL17753843 0.79 TSHR (0.33) ALDH1A1EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9971241-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-05-15 US disclosed
US-20160139508-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160139508-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN AFF1, AFF2, AFF4 MEN1 4160/4885KMT2A 1454/4885ALDH1A1 1178/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.