SCHEMBL1776245

SCHEMBL1776245

C=C(C(=O)O)C(CC=O)(C1=CCCC1)C1=CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5317601 0.81
SCHEMBL10584533 0.81 ALDH1A1 (0.31)
SCHEMBL8745223 0.73
SCHEMBL887657 0.69 HDAC4 (0.34)
SCHEMBL9836715 0.68 GSTP1 (0.31)
SCHEMBL7599835 0.66
Acrylic Acid SCHEMBL10953318 0.63
SCHEMBL27489068 0.62 ALDH1A1 (0.31)
SCHEMBL7073144 0.62 HDAC3 (0.32)
SCHEMBL5917767 0.62 HDAC3 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100081089-A1 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN LG CHEM, LTD. (KR) 2010-04-01 US claimed
WO-2008127036-A2 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN LG CHEM, LTD. (KR) 2008-10-23 WO claimed
EP-0315920-A2 High solids coating compositions containing allylether-functional polyester-urethanes and reactive diluents, and processes for making and using the same PPG INDUSTRIES, INC. (US) 1989-05-17 EP claimed
US-20240166902-A1 ACTIVE ENERGY RAY-CURABLE INKJET INK, AND PRINTED MATTER TOYO INK SC HOLDINGS CO., LTD. (JP) 2024-05-23 US disclosed
US-11952501-B2 Ink set and ink jet recording method SEIKO EPSON CORPORATION (JP) 2024-04-09 US disclosed
US-11914172-B2 Light absorbing body-containing film and backlight unit FUJIFILM CORPORATION (JP) 2024-02-27 US disclosed
US-20220195226-A1 Ink Set And Ink Jet Recording Method SEIKO EPSON CORPORATION (JP) 2022-06-23 US disclosed
US-20210388258-A1 PHOSPHOR-CONTAINING FILM AND BACKLIGHT UNIT FUJIFILM CORPORATION (JP) 2021-12-16 US disclosed
US-20210341652-A1 LIGHT ABSORBING BODY-CONTAINING FILM AND BACKLIGHT UNIT FUJIFILM CORPORATION (JP) 2021-11-04 US disclosed
US-11136496-B2 Phosphor-containing film and backlight unit FUJIFILM CORPORATION (JP) 2021-10-05 US disclosed
US-10982135-B2 Phosphor-containing film and backlight unit FUJIFILM CORPORATION (JP) 2021-04-20 US disclosed
US-7599133-B2 Optical part for camera and method of fabricating the same SANYO ELECTRIC CO., LTD. (JP) 2009-10-06 US disclosed
CN-101490732-A Resin composition and display device SONY CHEM & INF DEVICE CORP (JP) 2009-07-22 CN disclosed
US-20090085017-A1 COLORED CURABLE COMPOSITION, COLORED PATTERN AND COLOR FILTER USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090082487-A1 PIGMENT DISPERSION COMPOSITION, PHOTOCURABLE COMPOSITION AND COLOR FILTER FUJIFILM CORPORATION (JP) 2009-03-26 US disclosed
WO-2008127036-A2 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN LG CHEM, LTD. (KR) 2008-10-23 WO disclosed
US-20080204898-A1 OPTICAL PART FOR CAMERA AND METHOD OF FABRICATING THE SAME SANYO ELECTRIC CO., LTD. (JP) 2008-08-28 US disclosed
EP-0149357-A2 Filament winding resins HERCULES INCORPORATED (US) 1985-07-24 EP disclosed
US-4505986-A ALKYD RESIN MODIFIED BY A 2H-BENZOTRIAZOLE OR BENZOPHENONE DERIVATIVE;DURABILITY;WEATHERPROOFING AKZO N.V. (NL) 1985-03-19 US disclosed
US-4505954-A CURING A COATING OF UNSATURATED ACRYLIC MONMOMERS ON A PRIMER OF UNSATURATED ALKYD RESIN DAI NIPPON TORYO CO., LTD. (JP) 1985-03-19 US disclosed