SCHEMBL177783

SCHEMBL177783

C=CC=CC(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL458171 1.00
SCHEMBL28942101 1.00
SCHEMBL21816511 0.88 ALDH1A1 (0.45)
SCHEMBL21816510 0.88 ALDH1A1 (0.45)
SCHEMBL7867617 0.88
SCHEMBL7867615 0.88
SCHEMBL30956863 0.85 ALDH1A1 (0.38)
Butadiene SCHEMBL3924410 0.80 ALDH1A1 (0.56)
SCHEMBL13464870 0.79 ALDH1A1 (0.44)
SCHEMBL13464841 0.79 ALDH1A1 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 269 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119350239-A 5-Quinoline penta-2, 4-diene amide derivative and preparation method and application thereof 常熟理工学院 2025-01-24 CN claimed
US-12135503-B2 Organometallic photoresists for DUV or EUV lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2024-11-05 US claimed
CN-117186854-A Micro-nano collapse-preventing plugging agent for water-based drilling fluid and preparation method thereof 中国石油天然气集团有限公司 2023-12-08 CN claimed
CN-111732941-B Supermolecular gel leakage-stopping slurry and preparation method thereof 北京石大博诚科技有限公司 2023-04-07 CN claimed
US-20220317572-A1 ORGANOMETALLIC PHOTORESISTS FOR DUV OR EUV LITHOGRAPHY INTERNATIONAL BUSINESS MACHINES CORPORATION 2022-10-06 US claimed
CN-114999711-A Stain-resistant cable and preparation method thereof 赵琳 2022-09-02 CN claimed
CN-111732941-A Supermolecular gel leakage-stopping slurry and preparation method thereof 北京石大博诚科技有限公司 2020-10-02 CN claimed
CN-108191861-A N- [5- (pyrimidine -2- amino) -2,4- di-substituted-phenyls]-trans- -2,4- Pentadienamides 天津大学 2018-06-22 CN claimed
CN-108101889-A Deuterated N- [5- (pyrimidine -2- amino) -2,4- di-substituted-phenyls]-trans -2,4- Pentadienamides 天津大学 2018-06-01 CN claimed
US-8580752-B2 Aromatic amides as potentiators of bioefficacy of anti-infective drugs COUNCIL OF SCIENTITIC AND INDUSTRIAL RESEARCH (IN) 2013-11-12 US claimed
US-6153708-A HAVING AN N-1,3-BUTADIENYLCARBOXYLIC ACID AMIDE CONTENT OF 30 PPM OR LESS. SHOWA DENKO KABUSHIKI KAISHA (JP) 2000-11-28 US claimed
US-6143836-A PRODUCING HOMOPOLYMER OR COPOLYMER OF N-VINYLCARBOXYLIC ACID AMIDE BY POLYMERIZING HIGHLY POLYMERIZABLE N-VINYLCARBOXYLIC ACID AMIDE HAVING N-1,3-BUTADIENYLCARBOXYLIC ACID AMIDE CONTENT OF 30 PPM OR LESS; USE AS THICKENER SHOWA DENKO KABUSHIKI KAISHA (JP) 2000-11-07 US claimed
US-5892115-A PRETREATMENT BY THERMAL OR CATALYTIC CRACKING OF N-(1-ALKOXYETHYL)CARBOXYLIC AMIDE OR ETHYLIDENEBISCARBOXYLIC ACID AMIDE SHOWA DENKO KABUSHIKI KAISHA (JP) 1999-04-06 US claimed
CN-1193959-A Highly polymerizable N-vinylcarboxylic acid amides and process for producing the same SHOWA DENKO KK (JP) 1998-09-23 CN claimed
US-5789619-A USED AS COAGULANTS, LIQUID ABSORBENTS, THICKENERS SHOWA DENKO KABUSHIKI KAISHA (JP) 1998-08-04 US claimed
EP-0812311-A1 HIGHLY POLYMERIZABLE N-VINYLCARBOXYLIC ACID AMIDE AND PRODUCTION PROCESS THEREOF SHOWA DENKO KABUSHIKI KAISHA (JP) 1997-12-17 EP claimed
WO-1997024315-A1 HIGHLY POLYMERIZABLE N-VINYLCARBOXYLIC ACID AMIDE AND PRODUCTION PROCESS THEREOF SHOWA DENKO K.K. (JP) 1997-07-10 WO claimed
EP-0271829-B1 DELTA-HYDROXY-BETA-LYSINE DERIVATIVES AND THEIR PRODUCTION Takeda Chemical Industries, Ltd. (JP) 1993-08-25 EP claimed
US-4906659-A Antibiotic tan-749, its derivatives, production and use thereof TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1990-03-06 US claimed
EP-0271829-A2 Delta-hydroxy-beta-lysine derivatives and their production Takeda Chemical Industries, Ltd. (JP) 1988-06-22 EP claimed