SCHEMBL17789934

SCHEMBL17789934

COC(C)OC(C)c1ccco1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 1/20 0.37
KMT2A Q03164 5/20 0.35
POLB P06746 3/20 0.35
PKM P14618 1/20 0.35
PTPN1 P18031 1/20 0.35
PTPN7 P35236 1/20 0.35
BLM P54132 1/20 0.35
ESR2 Q92731 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
TP53 P04637 2/20 0.34
ALDH1A1 P00352 4/20 0.34
MEN1 O00255 4/20 0.34
MAPT P10636 3/20 0.34
KDM4E B2RXH2 2/20 0.34
TDP1 Q9NUW8 1/20 0.34
ATM Q13315 1/20 0.33
CYP2C19 P33261 1/20 0.33
HPGD P15428 2/20 0.33
HSD17B10 Q99714 2/20 0.33
AGTR1 P30556 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1153462 0.87 ALOX5 (0.41) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL18662435 0.83 ALOX5 (0.37) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL10812094 0.74
SCHEMBL21669924 0.73 KMT2A (0.40) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL4879525 0.73 KMT2A (0.40) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL4829955 0.72 ALOX5 (0.38) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL11007405 0.71 SLC6A2 (0.38) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL6202000 0.70
SCHEMBL14511544 0.70
SCHEMBL8431112 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9798242-B2 Rinse solution for pattern formation and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-24 US disclosed
US-9632416-B2 Rinse solution for pattern formation and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-25 US disclosed
US-20160154314-A1 RINSE SOLUTION FOR PATTERN FORMATION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-02 US disclosed
US-20160154312-A1 RINSE SOLUTION FOR PATTERN FORMATION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-02 US disclosed