Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 1/20 | 0.47 |
| ▸ | GBA1 | P04062 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | LPAR1 | Q92633 | 4/20 | 0.36 |
| ▸ | LPAR3 | Q9UBY5 | 4/20 | 0.36 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17789997 | 1.00 | DNM1 (0.47) | DNM1GBA1LMNATSHRTHRB | |
| SCHEMBL17789970 | 1.00 | DNM1 (0.47) | DNM1GBA1LMNATSHRTHRB | |
| SCHEMBL17789956 | 1.00 | DNM1 (0.47) | DNM1GBA1LMNATSHRTHRB | |
| SCHEMBL17789957 | 1.00 | DNM1 (0.47) | DNM1GBA1LMNATSHRTHRB | |
| SCHEMBL17789959 | 1.00 | DNM1 (0.47) | DNM1GBA1LMNATSHRTHRB | |
| SCHEMBL17789967 | 1.00 | DNM1 (0.47) | DNM1GBA1LMNATSHRTHRB | |
| SCHEMBL17789958 | 1.00 | DNM1 (0.47) | DNM1GBA1LMNATSHRTHRB | |
| SCHEMBL17789968 | 1.00 | DNM1 (0.47) | DNM1GBA1LMNATSHRTHRB | |
| SCHEMBL17789966 | 1.00 | DNM1 (0.47) | DNM1GBA1LMNATSHRTHRB | |
| SCHEMBL17789989 | 1.00 | DNM1 (0.47) | DNM1GBA1LMNATSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9798242-B2 | Rinse solution for pattern formation and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-24 | — | — | US | disclosed |
| US-9632416-B2 | Rinse solution for pattern formation and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-25 | — | — | US | disclosed |
| US-20160154314-A1 | RINSE SOLUTION FOR PATTERN FORMATION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-02 | — | — | US | disclosed |
| US-20160154312-A1 | RINSE SOLUTION FOR PATTERN FORMATION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-02 | — | — | US | disclosed |