SCHEMBL1780372

SCHEMBL1780372

CCC1(C(OC)C2CCC(C(OC)C3(CC)COC3)CC2)COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2468972 0.94
SCHEMBL35859 0.78
SCHEMBL2572805 0.76
SCHEMBL15514143 0.74
SCHEMBL27932438 0.73 ALDH1A1 (0.32)
SCHEMBL2572582 0.72
SCHEMBL504534 0.72
SCHEMBL5821445 0.70
SCHEMBL17818696 0.70
SCHEMBL27674545 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109305947-B Oxetane monomer compound and preparation method thereof 常州强力先端电子材料有限公司(CN) 2023-01-13 CN claimed
CN-110806676-A Photosensitive resin composition and application thereof 常州强力先端电子材料有限公司 2020-02-18 CN claimed
EP-3312211-B1 CURABLE COMPOSITION, ADHESIVE SHEET, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING ADHESIVE SHEET, AND DEVICE DAICEL CORP (JP) 2026-05-27 EP disclosed
EP-4703352-A1 SULFONATE, OXIME SULFONATE, IMIDE SULFONATE, AMIDE SULFONATE, ACID GENERATING AGENT CONTAINING SAID COMPOUND, AND PHOTORESIST CONTAINING SAID ACID GENERATING AGENT San-Apro Ltd. (JP) 2026-03-04 EP disclosed
EP-4613789-A1 EPOXY COMPOUND PRODUCT Daicel Corporation (JP) 2025-09-10 EP disclosed
EP-4596230-A1 MULTILAYER STRUCTURE AND METHOD FOR PRODUCING SAME, AUTOMOBILE PART, AIRCRAFT PART, AND DAMPING MATERIAL FOR CARBON-FIBER-REINFORCED PLASTIC Mitsubishi Chemical Corporation (JP) 2025-08-06 EP disclosed
US-12379525-B2 Plastic lens DAICEL CORPORATION (JP) 2025-08-05 US disclosed
US-20250243110-A1 CURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE, AND DISPLAY DEVICE DAICEL CORPORATION (JP) 2025-07-31 US disclosed
US-20250230326-A1 CURABLE RESIN COMPOSITION, COATING LAYER, LAMINATE, PLASTIC LENS, AND IMAGE DISPLAY DEVICE DAICEL CORPORATION (JP) 2025-07-17 US disclosed
US-20250178327-A1 MULTILAYER STRUCTURE AND METHOD FOR PRODUCING SAME, AUTOMOBILE PART, AIRCRAFT PART, AND DAMPING MATERIAL FOR CARBON-FIBER-REINFORCED PLASTIC MITSUBISHI CHEMICAL CORPORATION (JP) 2025-06-05 US disclosed
WO-2025100400-A1 EPOXY COMPOUND PRODUCT 株式会社ダイセル 2025-05-15 WO disclosed
EP-2891673-A1 CURABLE COMPOSITION, CURED PRODUCT THEREOF, OPTICAL MEMBER AND OPTICAL DEVICE Daicel Corporation (JP) 2015-07-08 EP disclosed
US-8981040-B2 Cationically polymerizable resin, cationically polymerizable resin composition, and cured products thereof DAICEL CORPORATION (JP) 2015-03-17 US disclosed
EP-2826799-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL COMPONENT Daicel Corporation (JP) 2015-01-21 EP disclosed
US-20130315553-A1 APPARATUS FOR PRODUCING OPTICAL FIBER, METHOD FOR PRODUCING OPTICAL FIBER, AND OPTICAL FIBER PRODUCED BY METHOD DAICEL CORPORATION (JP) 2013-11-28 US disclosed
US-8426516-B2 Polymer compound having aroylbiphenylene skeleton and thermocurable film forming polymer composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-04-23 US disclosed
US-20130035465-A1 RADICAL POLYMERIZABLE RESIN, RADICAL POLYMERIZABLE RESIN COMPOSITION, AND CURED PRODUCT THEREOF DAICEL CORPORATION (JP) 2013-02-07 US disclosed
US-20120309930-A1 CATIONICALLY POLYMERIZABLE RESIN, CATIONICALLY POLYMERIZABLE RESIN COMPOSITION, AND CURED PRODUCTS THEREOF DAICEL CORPORATION (JP) 2012-12-06 US disclosed
US-20110118408-A1 POLYMER COMPOUND HAVING AROYLBIPHENYLENE SKELETON AND THERMOCURABLE FILM FORMING POLYMER COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-05-19 US disclosed
WO-2008111640-A1 OXETHANE RESIN COMPOSITION NIPPON STEEL CHEMICAL CO., LTD. (JP) 2008-09-18 WO disclosed