SCHEMBL17818209

SCHEMBL17818209

CC(C)(C)C1CC(=Cc2ccc(N=[N+]=[N-])cc2)C(=O)C(=Cc2ccc(N=[N+]=[N-])cc2)C1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 5/20 0.48
▸ ALDH1A1 P00352 3/20 0.48
▸ NPSR1 Q6W5P4 3/20 0.48
▸ NPC1 O15118 3/20 0.48
▸ RAB9A P51151 3/20 0.48
▸ HSP90AA1 P07900 2/20 0.48
▸ MAPK1 P28482 2/20 0.48
▸ XBP1 P17861 1/20 0.48
▸ SMN1; SMN2 Q16637 1/20 0.48
▸ MEN1 O00255 4/20 0.47
▸ KMT2A Q03164 4/20 0.47
▸ NOD2 Q9HC29 1/20 0.47
▸ HTT P42858 2/20 0.46
▸ KDM4E B2RXH2 1/20 0.46
▸ POLB P06746 1/20 0.46
▸ PKM P14618 1/20 0.46
▸ ALOX12 P18054 1/20 0.46
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ CA1 P00915 1/20 0.36
▸ CA2 P00918 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27444996 0.87 MAPT (0.36) MAPTALDH1A1NPSR1NPC1RAB9A
SCHEMBL29145325 0.85 MAPT (0.35) MAPTALDH1A1NPSR1NPC1RAB9A
SCHEMBL13861280 0.85 MAPT (0.55) MAPTALDH1A1NPSR1NPC1RAB9A
SCHEMBL13886925 0.85 MAPT (0.55) MAPTALDH1A1NPSR1NPC1RAB9A
SCHEMBL13858828 0.85 MAPT (0.55) MAPTALDH1A1NPSR1NPC1RAB9A
SCHEMBL13882616 0.85 MAPT (0.55) MAPTALDH1A1NPSR1NPC1RAB9A
SCHEMBL13886921 0.82 CA1 (0.38) MAPTNPC1RAB9AHSP90AA1MAPK1
SCHEMBL13886919 0.82 USP18 (0.54) MAPTNPC1RAB9AHSP90AA1MAPK1
SCHEMBL13737944 0.81 MAPT (0.50) MAPTALDH1A1NPC1RAB9AHSP90AA1
SCHEMBL13870138 0.81 MAPT (0.41) MAPTALDH1A1NPC1RAB9AHSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117111405-B Preparation of linear polysiloxane low dielectric loss photosensitive resin and application of photoetching patterning 西南科技大学 2024-09-24 — — CN disclosed
CN-117111405-A Preparation of linear polysiloxane low dielectric loss photosensitive resin and application of photoetching patterning 西南科技大学 2023-11-24 — — CN disclosed
US-10415011-B2 Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition JSR CORPORATION (JP) 2019-09-17 — — US disclosed
EP-3040411-B1 ADHEREND RECOVERY METHOD AND ADHEREND RECOVERY DEVICE JSR CORP (JP) 2019-07-03 — — EP disclosed
EP-3040411-A1 ADHEREND RECOVERY METHOD, ADHEREND RECOVERY DEVICE, GAS GENERATION MEMBRANE, AND RESIN COMPOSITION JSR Corporation (JP) 2016-07-06 — — EP disclosed
US-20160168532-A1 ADHEREND RECOVERY METHOD, ADHEREND RECOVERY APPARATUS, GAS-GENERATING FILM AND RESIN COMPOSITION JSR CORPORATION (JP) 2016-06-16 — — US disclosed
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