Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.36 |
| ▸ | LTA4H | P09960 | 3/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.31 |
| ▸ | TGM2 | P21980 | 1/20 | 0.31 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.30 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | CA5A | P35218 | 1/20 | 0.30 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8150674 | 0.82 | CA4 (0.39) | CA4PAX8LTA4HTSHRALDH1A1 | |
| SCHEMBL22580518 | 0.82 | CA4 (0.39) | CA4PAX8LTA4HTSHRALDH1A1 | |
| SCHEMBL3336289 | 0.76 | LTA4H (0.39) | CA4PAX8LTA4HTSHRALDH1A1 | |
| SCHEMBL22563739 | 0.76 | LTA4H (0.39) | CA4PAX8LTA4HTSHRALDH1A1 | |
| SCHEMBL80762 | 0.76 | LTA4H (0.39) | CA4PAX8LTA4HTSHRALDH1A1 | |
| SCHEMBL8426084 | 0.74 | CA4 (0.41) | CA4PAX8LTA4HTSHRALDH1A1 | |
| SCHEMBL22654203 | 0.74 | CA4 (0.41) | CA4PAX8LTA4HTSHRALDH1A1 | |
| SCHEMBL13089302 | 0.74 | KCNA3 (0.34) | CA4LTA4HTSHRALDH1A1THRB | |
| SCHEMBL13089178 | 0.74 | KCNA3 (0.34) | CA4LTA4HTSHRALDH1A1THRB | |
| SCHEMBL14776711 | 0.73 | CA4 (0.43) | CA4PAX8LTA4HTSHRKCNA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20220220338-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| US-20220213348-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-11377522-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-05 | — | — | US | disclosed |
| EP-3971229-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-03-23 | — | — | EP | disclosed |
| EP-3957678-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2022-02-23 | — | — | EP | disclosed |
| WO-2020235325-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | 東京応化工業株式会社 (JP) | 2020-11-26 | — | — | WO | disclosed |
| US-20200362115-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA-BASED COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-11-19 | — | — | US | disclosed |
| WO-2020230828-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | 東京応化工業株式会社 | 2020-11-19 | — | — | WO | disclosed |
| EP-3257685-B1 | LITHOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR MANUFACTURING SAME, AND PRINTING METHOD USING SAME | FUJIFILM CORP (JP) | 2020-03-04 | — | — | EP | disclosed |
| US-10022998-B2 | Planographic printing plate precursor, method of producing same, and printing method using same | FUJIFILM CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| EP-3257685-A1 | LITHOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR MANUFACTURING SAME, AND PRINTING METHOD USING SAME | Fujifilm Corporation (JP) | 2017-12-20 | — | — | EP | disclosed |
| US-20170320350-A1 | PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING SAME, AND PRINTING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| US-8247590-B2 | Method for preventing polymerization of unsaturated organosilicon compounds | WACKER CHEMIE AG (DE) | 2012-08-21 | — | — | US | disclosed |
| WO-2012091154-A1 | METHOD OF PRODUCING A HYDROLYZABLE SILICON-CONTAINING COMPOUND | WASEDA UNIVERSITY (JP) | 2012-07-05 | — | — | WO | disclosed |
| US-20110118493-A1 | METHOD FOR PREVENTING POLYMERIZATION OF UNSATURATED ORGANOSILICON COMPOUNDS | WACKER CHEMIE AG (DE) | 2011-05-19 | — | — | US | disclosed |
| US-7291567-B2 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-20060024980-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| EP-1619226-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR Corporation (JP) | 2006-01-25 | — | — | EP | disclosed |
| US-6051665-A | A FLUOROPOLYMER IS OBTAINED FROM THE MONOMER SELECTED FROM THE GROUP CONTAINING A FLUORO-OLEFIN, A FLUORO VINYL ETHER, A FLUORO (METH) ACRYLATE AND MIXTURE, ALSO CONTAIN HYDROLYZABLE SILYL GROUP, A SILOXY COMPOUND AND A CHELATE COMPLEX | JSR CORPORATION (JP) | 2000-04-18 | — | — | US | disclosed |