Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NCEH1 | Q6PIU2 | 5/20 | 0.45 |
| ▸ | MGLL | Q99685 | 2/20 | 0.38 |
| ▸ | TBXA2R | P21731 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 3/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | CNR1 | P21554 | 1/20 | 0.37 |
| ▸ | RXFP1 | Q9HBX9 | 4/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20484104 | 0.92 | NCEH1 (0.43) | NCEH1MGLLLMNASMN1; SMN2RXFP1 | |
| SCHEMBL20483932 | 0.91 | NCEH1 (0.43) | NCEH1MGLLSMN1; SMN2RXFP1 | |
| SCHEMBL20483854 | 0.90 | NCEH1 (0.45) | NCEH1MGLLTBXA2RCNR1 | |
| SCHEMBL20484105 | 0.90 | NCEH1 (0.42) | NCEH1MGLLTBXA2R | |
| SCHEMBL20484008 | 0.90 | NCEH1 (0.42) | NCEH1MGLLTBXA2R | |
| SCHEMBL20484011 | 0.88 | NCEH1 (0.47) | NCEH1LMNASMN1; SMN2RXFP1KDM4E | |
| SCHEMBL17825877 | 0.82 | NCEH1 (0.49) | NCEH1MGLLTBXA2RLMNASMN1; SMN2 | |
| SCHEMBL19712907 | 0.82 | NCEH1 (0.44) | NCEH1MGLLTBXA2RLMNASMN1; SMN2 | |
| SCHEMBL20553821 | 0.81 | NCEH1 (0.36) | NCEH1MGLLLMNASMN1; SMN2RXFP1 | |
| SCHEMBL20483909 | 0.81 | NCEH1 (0.36) | NCEH1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3622512-B1 | FILM STRUCTURE COMPRISING A PHOTOPOLYMER COATING FOR HOLOGRAPHIC EXPOSURE AND A LACQUER LAYER WITH HIGH RESISTANCE | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2022-04-27 | — | — | EP | disclosed |
| EP-3622511-B1 | HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMERIC COATING FOR HOLOGRAPHIC EXPOSURE AND A LACQUER LAYER WITH HIGH RESISTANCE | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2022-04-27 | — | — | EP | disclosed |
| EP-3401909-A1 | FILM STRUCTURE COMPRISING A PHOTOPOLYMER COATING FOR HOLOGRAPHIC EXPOSURE AND A LACQUER LAYER WITH HIGH RESISTANCE | Covestro Deutschland AG (DE) | 2018-11-14 | — | — | EP | disclosed |
| EP-3401910-A1 | HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMERIC COATING FOR HOLOGRAPHIC EXPOSURE AND A LACQUER LAYER WITH HIGH RESISTANCE | Covestro Deutschland AG (DE) | 2018-11-14 | — | — | EP | disclosed |
| EP-3230261-B1 | NAPHTHYL ACRYLATE AS WRITE MONOMERS FOR PHOTOPOLYMERS | COVESTRO DEUTSCHLAND AG (DE) | 2018-09-05 | — | — | EP | disclosed |
| EP-3230261-A1 | NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS | Covestro Deutschland AG (DE) | 2017-10-18 | — | — | EP | disclosed |
| WO-2016091965-A1 | NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS | COVESTRO DEUTSCHLAND AG (DE) | 2016-06-16 | — | — | WO | disclosed |