Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NCEH1 | Q6PIU2 | 5/20 | 0.44 |
| ▸ | MGLL | Q99685 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | CNR1 | P21554 | 2/20 | 0.36 |
| ▸ | RXFP1 | Q9HBX9 | 4/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19712921 | 0.90 | NCEH1 (0.40) | NCEH1MGLLKDM4E | |
| SCHEMBL19712923 | 0.89 | NCEH1 (0.40) | NCEH1MGLLTBXA2R | |
| SCHEMBL19712946 | 0.89 | NCEH1 (0.40) | NCEH1MGLLTBXA2R | |
| SCHEMBL19712955 | 0.89 | NCEH1 (0.44) | NCEH1MGLLLMNACNR1TBXA2R | |
| SCHEMBL19712925 | 0.87 | NCEH1 (0.47) | NCEH1LMNASMN1; SMN2RXFP1KDM4E | |
| SCHEMBL17825877 | 0.83 | NCEH1 (0.49) | NCEH1MGLLLMNASMN1; SMN2CNR1 | |
| SCHEMBL17825840 | 0.82 | NCEH1 (0.45) | NCEH1MGLLLMNASMN1; SMN2CNR1 | |
| SCHEMBL19712928 | 0.80 | ALDH1A1 (0.38) | LMNAL3MBTL1 | |
| SCHEMBL13380544 | 0.77 | NCEH1 (0.49) | NCEH1LMNASMN1; SMN2KDM4E | |
| SCHEMBL19712913 | 0.76 | NCEH1 (0.49) | NCEH1MGLL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11267943-B2 | Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance | COVESTRO DEUTSCHLAND AG (DE) | 2022-03-08 | — | — | US | disclosed |
| US-20210292505-A1 | FILM STRUCTURE CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A COATING LAYER OF HIGH RESISTANCE | COVESTRO DEUTSCHLAND AG (DE) | 2021-09-23 | — | — | US | disclosed |
| US-20200166888-A1 | HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A HIGHLY RESISTANT COATING LAYER | COVESTRO DEUTSCHLAND AG (DE) | 2020-05-28 | — | — | US | disclosed |
| US-10241402-B2 | Naphthyl acrylates as writing monomers for photopolymers | COVESTRO DEUTSCHLAND AG (DE) | 2019-03-26 | — | — | US | disclosed |
| US-20170363957-A1 | NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS | COVESTRO DEUTSCHLAND AG (DE) | 2017-12-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170363957-A1 | NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS | NEFM, ACR, DIAPH1 | NCEH1 4259/4885MGLL 2733/4885LMNA 1044/4885 |
| US-10241402-B2 | Naphthyl acrylates as writing monomers for photopolymers | NEFM, ACR, DIAPH1 | NCEH1 4259/4885MGLL 2733/4885LMNA 1044/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.