SCHEMBL17827263

SCHEMBL17827263

CC1(F)CCC(F)(F)C1(C)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9908376 0.82
SCHEMBL8738428 0.73
SCHEMBL8736839 0.73
SCHEMBL8737634 0.71
SCHEMBL605677 0.67
SCHEMBL4550217 0.65
SCHEMBL726127 0.64
SCHEMBL9418585 0.64
SCHEMBL25002994 0.60
SCHEMBL791384 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110800087-B Substrate processing method, substrate processing liquid, and substrate processing apparatus 株式会社斯库林集团 2024-03-19 CN disclosed
CN-116864419-A Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2023-10-10 CN disclosed
CN-116825612-A Substrate processing method and substrate processing device 株式会社斯库林集团 2023-09-29 CN disclosed
CN-109904093-B Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2023-08-29 CN disclosed
CN-109545655-B Substrate processing method and substrate processing device 株式会社斯库林集团 2023-08-11 CN disclosed
CN-110168704-B Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2023-07-25 CN disclosed
US-11574821-B2 Substrate treating method, substrate treating liquid and substrate treating apparatus SCREEN Holdings Co., Ltd. 2023-02-07 US disclosed
CN-109309032-B Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2022-07-15 CN disclosed
US-20220189762-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2022-06-16 US disclosed
US-11302525-B2 Substrate processing method and substrate processing apparatus SCREEN Holdings Co., Ltd. 2022-04-12 US disclosed
US-20190091736-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-03-28 US disclosed
CN-109309032-A Substrate processing method using same and substrate board treatment 株式会社斯库林集团 2019-02-05 CN disclosed
US-20190030576-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-01-31 US disclosed
EP-3435405-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-01-30 EP disclosed
US-10153181-B2 Substrate treating apparatus and substrate treating method SCREEN Holdings Co., Ltd. (JP) 2018-12-11 US disclosed
CN-107481954-A Substrate board treatment and substrate processing method using same 株式会社斯库林集团 2017-12-15 CN disclosed
US-20170345683-A1 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD SCREEN Holdings Co., Ltd. (JP) 2017-11-30 US disclosed
EP-3249682-A1 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD SCREEN Holdings Co., Ltd. (JP) 2017-11-29 EP disclosed
US-9665069-B2 Electric generator device, timepiece movement, and timepiece ASAHI GLASS COMPANY, LIMITED (JP) 2017-05-30 US disclosed
US-20160170377-A1 ELECTRIC GENERATOR DEVICE, TIMEPIECE MOVEMENT, AND TIMEPIECE ASAHI GLASS COMPANY, LIMITED (JP) 2016-06-16 US disclosed