⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17827263 | 0.82 | — | — | |
| SCHEMBL8738428 | 0.82 | — | — | |
| SCHEMBL8736839 | 0.82 | — | — | |
| SCHEMBL8737634 | 0.79 | — | — | |
| SCHEMBL605677 | 0.75 | — | — | |
| SCHEMBL9908356 | 0.74 | — | — | |
| SCHEMBL9908389 | 0.74 | — | — | |
| SCHEMBL4550217 | 0.73 | — | — | |
| SCHEMBL9418585 | 0.71 | — | — | |
| SCHEMBL726127 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170233316-A1 | PROCESS FOR THE PRODUCTION OF FLUORINATED CYCLOBUTANE | SOLSTICE ADVANCED MATERIALS US, INC. | 2017-08-17 | — | — | US | disclosed |
| US-20170137353-A1 | Process for Making 2,3,3,3-Tetrafluoropropene and/or Vinylidine Fluoride | HONEYWELL INTERNATIONAL INC. | 2017-05-18 | — | — | US | disclosed |
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |