SCHEMBL1782902

SCHEMBL1782902

C=C(C(=O)O)C(CC)CCO

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.39
MAPK1 P28482 1/20 0.39
CHRM1 P11229 1/20 0.34
AKR1A1 P14550 1/20 0.34
CHRM3 P20309 1/20 0.34
HTR2A P28223 1/20 0.34
HTR2C P28335 1/20 0.34
ADRA1A P35348 1/20 0.34
HRH1 P35367 1/20 0.34
DRD3 P35462 1/20 0.34
SLC6A3 Q01959 1/20 0.34
HDAC1 Q13547 1/20 0.34
HDAC2 Q92769 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
CA1 P00915 4/20 0.34
SLC1A3 P43003 1/20 0.33
SLC1A2 P43004 1/20 0.33
SLC1A1 P43005 1/20 0.33
USP2 O75604 1/20 0.32
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10954225 0.88 CA2 (0.45) CA2MAPK1CHRM1AKR1A1CHRM3
SCHEMBL2996538 0.86 TET2 (0.31)
SCHEMBL1173517 0.85 CHRM1 (0.48) CA2MAPK1CHRM1AKR1A1CHRM3
SCHEMBL651077 0.84 CHRM1 (0.52) CA2MAPK1CHRM1AKR1A1CHRM3
SCHEMBL1499647 0.84 CA2 (0.41) CA2MAPK1CHRM1AKR1A1CHRM3
SCHEMBL10582349 0.82 SLC1A1 (0.40) CA2MAPK1CHRM1AKR1A1CHRM3
SCHEMBL4946235 0.81 CA2 (0.63) CA2MAPK1CHRM1AKR1A1CHRM3
SCHEMBL3665140 0.80
SCHEMBL194218 0.79 CA2 (0.55) CA2MAPK1CA1SLC1A2SLC1A1
SCHEMBL2107092 0.79 CA2 (0.46) CA2MAPK1SLC1A2SLC1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110117332-A1 ACRYLATE RESIN, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND PHOTORESIST PATTERN LG CHEM. LTD. (KR) 2011-05-19 US claimed
US-20230002699-A1 CONTINUOUS ACOUSTIC MIXING FOR PERFORMANCE ADDITIVES AND COMPOSITIONS INCLUDING THE SAME THE LUBRIZOL CORPORATION (US) 2023-01-05 US disclosed
US-20110117332-A1 ACRYLATE RESIN, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND PHOTORESIST PATTERN LG CHEM. LTD. (KR) 2011-05-19 US disclosed
US-7070840-B2 Inkjet recording sheet FUJI PHOTO FILM CO., LTD. (JP) 2006-07-04 US disclosed
US-20030068476-A1 Inkjet recording sheet FUJI PHOTO FILM CO., LTD. 2003-04-10 US disclosed
EP-1253021-A2 Inkjet recording sheet FUJI PHOTO FILM CO., LTD. (JP) 2002-10-30 EP disclosed