SCHEMBL1782942

SCHEMBL1782942

CCC(O)c1ccc2ccc3cccc4ccc1c2c34

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.46
HPGD P15428 5/20 0.46
HSD17B10 Q99714 4/20 0.46
CYP3A4 P08684 2/20 0.46
TSHR P16473 2/20 0.46
TDP1 Q9NUW8 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
KDM4E B2RXH2 4/20 0.40
MAPT P10636 1/20 0.40
CYP1A2 P05177 5/20 0.39
CYP1A1 P04798 1/20 0.39
CYP1B1 Q16678 1/20 0.39
ERBB2 P04626 1/20 0.39
FYN P06241 1/20 0.39
MAOA P21397 1/20 0.39
ACHE P22303 1/20 0.39
AHR P35869 1/20 0.39
LMNA P02545 1/20 0.38
KMT2A Q03164 2/20 0.38
CYP2D6 P10635 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL506055 0.86 ALDH1A1 (0.43) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL29980279 0.86 ALDH1A1 (0.43) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL10529679 0.83 PPARG (0.41) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL11689316 0.83 ALDH1A1 (0.43) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL4425343 0.82 PPARG (0.43) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL28101433 0.82 ALDH1A1 (0.41) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL3053893 0.81 ALDH1A1 (0.48) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL29980211 0.79 ALDH1A1 (0.50) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL2400092 0.79 ALDH1A1 (0.50) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL6583480 0.79 ALDH1A1 (0.48) ALDH1A1HPGDHSD17B10CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112701419-B SEI film material, preparation method and negative plate 珠海冠宇动力电池有限公司 2022-11-04 CN disclosed
US-9116429-B2 Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same CHEIL INDUSTRIES, INC. (KR) 2015-08-25 US disclosed
US-9116429-B2 Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same CHEIL INDUSTRIES, INC. (KR) 2015-08-25 US disclosed
US-20110117501-A1 RESIST UNDERLAYER POLYMER, RESIST UNDERLAYER COMPOSITION INCLUDING THE SAME, AND METHOD OF PATTERNING USING THE SAME CHEIL INDUSTRIES, INC. (KR) 2011-05-19 US disclosed
US-20110117501-A1 RESIST UNDERLAYER POLYMER, RESIST UNDERLAYER COMPOSITION INCLUDING THE SAME, AND METHOD OF PATTERNING USING THE SAME CHEIL INDUSTRIES, INC. (KR) 2011-05-19 US disclosed