Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 2/20 | 0.47 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.47 |
| ▸ | ACHE | P22303 | 1/20 | 0.44 |
| ▸ | ELANE | P08246 | 1/20 | 0.40 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.39 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.39 |
| ▸ | CALM1 | P0DP23 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.36 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.36 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.36 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.36 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.36 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.36 |
| ▸ | GPBAR1 | Q8TDU6 | 1/20 | 0.36 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.34 |
| ▸ | NOS2 | P35228 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4353040 | 0.90 | CYP4F2 (0.53) | CYP4F2CYP4A11ACHEELANEKMT2A | |
| SCHEMBL15388361 | 0.87 | PTPN1 (0.45) | CYP4F2CYP4A11ELANEPTPN1PTPN11 | |
| SCHEMBL8151618 | 0.84 | ELANE (0.47) | ELANEPTPN1PTPN11KMT2AATM | |
| SCHEMBL15495984 | 0.80 | CYP3A4 (0.50) | CYP4F2CYP4A11ACHEELANEKMT2A | |
| SCHEMBL15388780 | 0.78 | KMT2A (0.43) | ELANECALM1KMT2AATMGABRA1 | |
| SCHEMBL15388887 | 0.78 | ELANE (0.42) | ELANEPTPN1KMT2AATMCYP3A4 | |
| SCHEMBL4350998 | 0.77 | ELANE (0.46) | CYP4F2CYP4A11ACHEELANEKMT2A | |
| SCHEMBL15388810 | 0.77 | ELANE (0.40) | ELANEKMT2AATMCYP3A4PTGS2 | |
| SCHEMBL17829501 | 0.77 | ELANE (0.41) | CYP4F2CYP4A11ELANEPTPN1KMT2A | |
| SCHEMBL18779819 | 0.77 | ELANE (0.41) | CYP4F2CYP4A11ELANEPTPN1PTPN11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10457761-B2 | Polymer, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-29 | — | — | US | disclosed |
| US-10191373-B2 | Method for producing polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-01-29 | — | — | US | disclosed |
| US-20170226250-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-10 | — | — | US | disclosed |
| US-20170226250-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-10 | — | — | US | disclosed |
| US-20170097567-A1 | METHOD FOR PRODUCING POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-20170097567-A1 | METHOD FOR PRODUCING POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-20160229940-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160229940-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160168296-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160168296-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-16 | — | — | US | disclosed |