Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | SLC22A2 | O15244 | 2/20 | 0.42 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.35 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.35 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.35 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.35 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.35 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.35 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | STAT6 | P42226 | 1/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18709055 | 0.86 | NPSR1 (0.33) | NPSR1SLC22A2SLC47A1MAPT | |
| SCHEMBL14094016 | 0.81 | NPSR1 (0.38) | NPSR1SLC22A2SLC47A1MAPTGRIN2D | |
| SCHEMBL10324217 | 0.80 | NPSR1 (0.40) | NPSR1SLC22A2SLC47A1MAPTGRIN2D | |
| SCHEMBL20712063 | 0.80 | NPSR1 (0.45) | NPSR1SLC22A2SLC47A1MAPTGRIN2D | |
| SCHEMBL14643023 | 0.80 | NPSR1 (0.40) | NPSR1SLC22A2SLC47A1MAPTGRIN2D | |
| SCHEMBL14962518 | 0.80 | NPSR1 (0.40) | NPSR1SLC22A2SLC47A1MAPTGRIN2D | |
| SCHEMBL4389241 | 0.80 | NPSR1 (0.45) | NPSR1SLC22A2SLC47A1MAPTGRIN2D | |
| SCHEMBL12948772 | 0.80 | NPSR1 (0.40) | NPSR1SLC22A2SLC47A1MAPTGRIN2D | |
| SCHEMBL10629454 | 0.80 | SLC22A2 (0.50) | NPSR1SLC22A2SLC47A1MAPTGRIN2D | |
| SCHEMBL5933264 | 0.80 | NPSR1 (0.40) | NPSR1SLC22A2SLC47A1MAPTGRIN2D |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822241-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11815813-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-11675267-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-13 | — | — | US | disclosed |
| US-20230004084-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-05 | — | — | US | disclosed |
| US-11327399-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-10 | — | — | US | disclosed |
| US-20210389672-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-16 | — | — | US | disclosed |
| EP-3744710-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-02 | — | — | EP | disclosed |
| US-10795258-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-06 | — | — | US | disclosed |
| EP-2955575-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYPHENOL DERIVATIVE USED IN SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| US-20170329223-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-16 | — | — | US | disclosed |
| US-9612533-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-04-04 | — | — | US | disclosed |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-19 | — | — | US | disclosed |
| US-20150212408-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-07-30 | — | — | US | disclosed |
| US-20120059162-A1 | FUSED IMIDAZOLE DERIVATIVE HAVING TTK INHIBITORY ACTION | ONCOTHERAPY SCIENCE, INC. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-7459261-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-02 | — | — | US | disclosed |
| US-7459261-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-02 | — | — | US | disclosed |
| US-6794528-B2 | HEAT RESISTANCE, FLAME RETARDERS, STABILIZERS; REACTING DIALCOHOL COMPOUND WITH A PHOSPHYL OXYCHLORIDE COMPOUND | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-09-21 | — | — | US | disclosed |
| US-20030109736-A1 | Phosphorus compound | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-06-12 | — | — | US | disclosed |
| EP-1277758-A1 | PHOSPHORUS COMPOUND | Daicel Chemical Industries, Ltd. (JP) | 2003-01-22 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120059162-A1 | FUSED IMIDAZOLE DERIVATIVE HAVING TTK INHIBITORY ACTION | NR0B1, GRK7, NR5A2 | NPSR1 550/4885SLC22A2 2968/4885SLC47A1 2361/4885 |
| US-20230004084-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-10, H1-0, H1-4 | NPSR1 2083/4885SLC22A2 1189/4885SLC47A1 3179/4885 |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | AFF1, AFF2, AFF4 | NPSR1 1176/4885SLC22A2 1050/4885SLC47A1 1118/4885 |
| US-11822241-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, CHRM1 | NPSR1 2056/4885SLC22A2 2829/4885SLC47A1 4097/4885 |
| US-20030109736-A1 | Phosphorus compound | NR4A1, POLL, NR0B1 | NPSR1 375/4885SLC22A2 2511/4885SLC47A1 3065/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.