Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 2/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 2/20 | 0.32 |
| ▸ | KCNH2 | Q12809 | 6/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL31293699 | 0.82 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL1293248 | 0.76 | GPR3 (0.39) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL25292546 | 0.75 | GPR3 (0.48) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL20570425 | 0.75 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL7567644 | 0.75 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL25292878 | 0.75 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL25255863 | 0.75 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL25287606 | 0.75 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL25285896 | 0.75 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL23430060 | 0.75 | CA1 (0.44) | GPR3CA1CA2CA7CA13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11003077-B2 | Positive photoresist composition, photoresist pattern using the same, and manufacturing method of the photoresist pattern | LG CHEM, LTD. (KR) | 2021-05-11 | — | — | US | claimed |
| US-20190146338-A1 | POSITIVE PHOTORESIST COMPOSITION, PHOTORESIST PATTERN USING THE SAME, AND MANUFACTURING METHOD OF THE PHOTORESIST PATTERN | LG CHEM, LTD. (KR) | 2019-05-16 | — | — | US | claimed |
| WO-2015135864-A1 | PHOTOSENSITIVE POLYMER RESIN, PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME, AND LAYER MADE THEREFROM | SOLVAY SA (BE) | 2015-09-17 | — | — | WO | claimed |
| EP-2918616-A1 | Photosensitive polymer resin, photosensitive resin composition comprising the same, and layer made therefrom | Solvay SA (BE) | 2015-09-16 | — | — | EP | claimed |
| US-20110117332-A1 | ACRYLATE RESIN, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND PHOTORESIST PATTERN | LG CHEM. LTD. (KR) | 2011-05-19 | — | — | US | claimed |
| US-11624982-B2 | Photosensitive resin composition and cured film | LG CHEM, LTD. (KR) | 2023-04-11 | — | — | US | disclosed |
| US-11573492-B2 | Photoresist composition | LG CHEM, LTD. (KR) | 2023-02-07 | — | — | US | disclosed |
| US-11531268-B2 | Positive-working photoresist composition, pattern produced therefrom, and method for producing pattern | LG CHEM, LTD. (KR) | 2022-12-20 | — | — | US | disclosed |
| US-11003077-B2 | Positive photoresist composition, photoresist pattern using the same, and manufacturing method of the photoresist pattern | LG CHEM, LTD. (KR) | 2021-05-11 | — | — | US | disclosed |
| US-20210011379-A1 | POSITIVE-WORKING PHOTORESIST COMPOSITION, PATTERN PRODUCED THEREFROM, AND METHOD FOR PRODUCING PATTERN | LG CHEM, LTD. (KR) | 2021-01-14 | — | — | US | disclosed |
| US-20200218153-A1 | PHOTORESIST COMPOSITION | LG CHEM, LTD. (KR) | 2020-07-09 | — | — | US | disclosed |
| US-20200166842-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM | LG CHEM, LTD. (KR) | 2020-05-28 | — | — | US | disclosed |
| US-20190146338-A1 | POSITIVE PHOTORESIST COMPOSITION, PHOTORESIST PATTERN USING THE SAME, AND MANUFACTURING METHOD OF THE PHOTORESIST PATTERN | LG CHEM, LTD. (KR) | 2019-05-16 | — | — | US | disclosed |
| WO-2015135864-A1 | PHOTOSENSITIVE POLYMER RESIN, PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME, AND LAYER MADE THEREFROM | SOLVAY SA (BE) | 2015-09-17 | — | — | WO | disclosed |
| EP-2918616-A1 | Photosensitive polymer resin, photosensitive resin composition comprising the same, and layer made therefrom | Solvay SA (BE) | 2015-09-16 | — | — | EP | disclosed |
| US-20110117332-A1 | ACRYLATE RESIN, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND PHOTORESIST PATTERN | LG CHEM. LTD. (KR) | 2011-05-19 | — | — | US | disclosed |