⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17883748 | 0.94 | KDM4E (0.32) | — | |
| SCHEMBL19320630 | 0.90 | — | — | |
| SCHEMBL17879736 | 0.86 | LCK (0.34) | — | |
| SCHEMBL19325615 | 0.86 | — | — | |
| SCHEMBL17879771 | 0.82 | ALDH1A1 (0.47) | — | |
| SCHEMBL17883746 | 0.80 | LCK (0.38) | — | |
| SCHEMBL18807414 | 0.75 | GAA (0.32) | — | |
| SCHEMBL19325408 | 0.75 | KDM4E (0.34) | — | |
| SCHEMBL19320584 | 0.73 | ALDH1A1 (0.47) | — | |
| SCHEMBL18823036 | 0.71 | HSD17B10 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11796916-B2 | Pattern formation methods and photoresist pattern overcoat compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-10-24 | — | — | US | disclosed |
| US-20180188654-A1 | PATTERN-FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-07-05 | — | — | US | disclosed |
| US-10007179-B2 | Thermal acid generators and photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-06-26 | — | — | US | disclosed |
| US-20180118968-A1 | TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-05-03 | — | — | US | disclosed |
| US-9869933-B2 | Pattern trimming methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-01-16 | — | — | US | disclosed |
| US-9760011-B1 | Pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-09-12 | — | — | US | disclosed |
| US-20170255103-A1 | PATTERN TRIMMING METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-09-07 | — | — | US | disclosed |
| US-9696629-B2 | Photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-04 | — | — | US | disclosed |
| US-20170123314-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-05-04 | — | — | US | disclosed |
| US-20170123313-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | ROHM & HAAS ELECT MAT (US) | 2017-05-04 | — | — | US | disclosed |
| US-20160187783-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-06-30 | — | — | US | disclosed |