SCHEMBL17879997

SCHEMBL17879997

C=C(C)C(=O)Oc1c(C)cc(Oc2c(C)cc(Oc3c(C)cc(Oc4ccc(C(C)(C)c5ccc(Oc6cc(C)c(Oc7cc(C)c(Oc8cc(C)c(OC(=O)C(=C)C)c(C)c8)c(C)c7)c(C)c6)cc5)cc4)cc3C)cc2C)cc1C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ATM Q13315 2/20 0.36
KMT2A Q03164 1/20 0.36
ELANE P08246 2/20 0.36
ESRRA P11474 1/20 0.34
KCNA3 P22001 1/20 0.33
RAB9A P51151 2/20 0.32
MAPT P10636 1/20 0.32
HPGD P15428 1/20 0.32
THRA P10827 2/20 0.32
THRB P10828 2/20 0.32
NPC1 O15118 1/20 0.32
POLB P06746 1/20 0.32
CYP2C9 P11712 1/20 0.32
ESR1 P03372 1/20 0.31
PPARD Q03181 1/20 0.31
AR P10275 1/20 0.31
PTGDR2 Q9Y5Y4 1/20 0.30
PTPN1 P18031 1/20 0.30
ALDH1A1 P00352 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15165067 0.97 ELANE (0.38) ATMKMT2AELANEESRRARAB9A
SCHEMBL12020419 0.91 KMT2A (0.35) ATMKMT2AELANEKCNA3PTPN1
SCHEMBL17879993 0.91 KMT2A (0.35) ATMKMT2AELANEKCNA3PTPN1
SCHEMBL14173073 0.86 ESR1 (0.38) ATMKMT2AELANEMAPTHPGD
SCHEMBL3899570 0.82 ELANE (0.51) ATMKMT2AELANEESRRARAB9A
SCHEMBL8585795 0.82 ELANE (0.51) ATMKMT2AELANEESRRARAB9A
SCHEMBL14191590 0.82 KMT2A (0.41) ATMKMT2AELANEKCNA3MAPT
SCHEMBL14173150 0.82 ELANE (0.36) ATMKMT2AELANEMAPTHPGD
SCHEMBL10050181 0.81 ATM (0.43) ATMKMT2AELANEKCNA3MAPT
SCHEMBL16775425 0.81 PTPN1 (0.39) ATMKMT2AELANEKCNA3MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9508549-B2 Methods of forming electronic devices including filling porous features with a polymer DOW GLOBAL TECHNOLOGIES LLC (US) 2016-11-29 US disclosed
US-20160189953-A1 METHODS OF FORMING ELECTRONIC DEVICES ROHM AND HAAS ELECTRONIC MATERIALS LLC 2016-06-30 US disclosed