SCHEMBL17880000

SCHEMBL17880000

Cc1cc(Oc2c(C)cc(Oc3c(C)cc(Oc4c(C)cc(C(C)(C)c5cc(C)c(Oc6cc(C)c(Oc7cc(C)c(Oc8cc(C)c(O)c(C)c8)c(C)c7)c(C)c6)c(C)c5)cc4C)cc3C)cc2C)cc(C)c1O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 2/20 0.44
ALOX15 P16050 3/20 0.41
ALOX12 P18054 2/20 0.41
CYP3A4 P08684 2/20 0.41
HPGD P15428 2/20 0.41
TSHR P16473 2/20 0.41
HSD17B10 Q99714 2/20 0.41
ALDH1A1 P00352 1/20 0.41
CASP1 P29466 1/20 0.41
RECQL P46063 1/20 0.41
HIF1A Q16665 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
ESR1 P03372 3/20 0.39
ESR2 Q92731 2/20 0.39
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
GPR35 Q9HC97 1/20 0.35
MAPK1 P28482 1/20 0.35
HTT P42858 1/20 0.35
CHEK1 O14757 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12011755 1.00 PTPN1 (0.44) PTPN1ALOX15ALOX12CYP3A4HPGD
SCHEMBL677498 1.00 PTPN1 (0.44) PTPN1ALOX15ALOX12CYP3A4HPGD
SCHEMBL14749884 0.93 PTPN1 (0.46) PTPN1ALOX15ALOX12CYP3A4HPGD
SCHEMBL14186008 0.93 PTPN1 (0.50) PTPN1ALOX15ALOX12CYP3A4HPGD
SCHEMBL677550 0.89 PTPN1 (0.44) PTPN1ALOX15HPGDHSD17B10ALDH1A1
SCHEMBL677492 0.89 PTPN1 (0.44) PTPN1ALOX15HPGDHSD17B10ALDH1A1
SCHEMBL17879953 0.88 ESR1 (0.42) PTPN1ALOX15ALOX12CYP3A4HPGD
SCHEMBL30436898 0.88 ESR1 (0.42) PTPN1ALOX15ALOX12CYP3A4HPGD
SCHEMBL676768 0.85 PTPN1 (0.41) PTPN1ESR1ESR2CA1CA2
SCHEMBL677484 0.85 PTPN1 (0.41) PTPN1ESR1ESR2CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9508549-B2 Methods of forming electronic devices including filling porous features with a polymer DOW GLOBAL TECHNOLOGIES LLC (US) 2016-11-29 US disclosed
US-20160189953-A1 METHODS OF FORMING ELECTRONIC DEVICES ROHM AND HAAS ELECTRONIC MATERIALS LLC 2016-06-30 US disclosed