Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.54 |
| ▸ | GAA | P10253 | 2/20 | 0.54 |
| ▸ | POLB | P06746 | 2/20 | 0.54 |
| ▸ | GLA | P06280 | 1/20 | 0.54 |
| ▸ | KIF11 | P52732 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CA6 | P23280 | 1/20 | 0.35 |
| ▸ | CA5A | P35218 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16357060 | 0.86 | TSHR (0.43) | TSHRGAAPOLBGLAKIF11 | |
| SCHEMBL30568362 | 0.85 | TSHR (0.46) | TSHRGAAPOLBGLAKIF11 | |
| SCHEMBL13990210 | 0.83 | TSHR (0.45) | TSHRGAAPOLBGLAKIF11 | |
| SCHEMBL15801320 | 0.82 | TSHR (0.42) | TSHRGAAPOLBGLAKIF11 | |
| SCHEMBL11844970 | 0.82 | GAA (0.54) | TSHRGAAPOLBGLAKIF11 | |
| SCHEMBL13385893 | 0.81 | KIF11 (0.55) | TSHRGAAPOLBGLAKIF11 | |
| SCHEMBL392404 | 0.80 | TSHR (0.52) | TSHRGAAPOLBGLAKIF11 | |
| SCHEMBL13385850 | 0.79 | TSHR (0.76) | TSHRGAAPOLBGLAKIF11 | |
| SCHEMBL3115697 | 0.78 | GAA (0.50) | TSHRGAAPOLBGLAKIF11 | |
| SCHEMBL5511595 | 0.78 | GAA (0.50) | TSHRGAAPOLBGLAKIF11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119912689-A | Resin, resin composition and cured film | 华为技术有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-119798189-A | Diamine monomer with epoxy structure, preparation method thereof and polyimide resin | 比亚迪股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-118388398-A | Diamine monomer, preparation method thereof, resin, solution thereof and cured film | 深圳先进电子材料国际创新研究院 | 2024-07-26 | — | — | CN | claimed |
| CN-118047948-A | Resin, preparation method thereof and resin composition | 华为技术有限公司 | 2024-05-17 | — | — | CN | claimed |
| CN-117304037-A | Diamine monomer, preparation method thereof, resin and application thereof | 华为技术有限公司 | 2023-12-29 | — | — | CN | claimed |
| US-20250346020-A1 | LAMINATE AND DISPLAY | KANEKA CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| US-20250320338-A1 | TRANSPARENT FILM, HARD COAT FILM, AND DISPLAY | KANEKA CORPORATION (JP) | 2025-10-16 | — | — | US | disclosed |
| CN-119912689-A | Resin, resin composition and cured film | 华为技术有限公司 | 2025-05-02 | — | — | CN | disclosed |
| CN-119798189-A | Diamine monomer with epoxy structure, preparation method thereof and polyimide resin | 比亚迪股份有限公司 | 2025-04-11 | — | — | CN | disclosed |
| US-20250109264-A1 | FILM, METHOD FOR MANUFACTURING SAME, AND IMAGE DISPLAY DEVICE | KANEKA CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| US-20250075037-A1 | POROUS POLYIMIDE HAVING HIGHLY UNIFORM NANO STRUCTURE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-03-06 | — | — | US | disclosed |
| US-12234323-B2 | Transparent polyimide film and production method therefor | KANEKA CORPORATION (JP) | 2025-02-25 | — | — | US | disclosed |
| US-6890626-B1 | Imide-benzoxazole polycondensate and process for producing the same | PI R&D CO., LTD. (JP) | 2005-05-10 | — | — | US | disclosed |
| EP-1123954-B1 | COMPOSITION FOR POLYIMIDE ELECTRODEPOSITION AND METHOD OF FORMING PATTERNED POLYIMIDE FILM WITH THE SAME | PI R & D CO LTD (JP) | 2005-04-13 | — | — | EP | disclosed |
| US-20040197699-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1431822-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2004-06-23 | — | — | EP | disclosed |
| US-6630064-B1 | Electro-depositing polyimide membranes which can be patterned by photolithography, which are excellent in heat resistance, insulation performance and in chemical resistance, photoacid generator, a positive-type photosensitive polyimide | PI R&D CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| EP-1262509-A1 | IMIDE-BENZOXAZOLE POLYCONDENSATE AND PROCESS FOR PRODUCING THE SAME | PI R & D Co., Ltd. (JP) | 2002-12-04 | — | — | EP | disclosed |
| EP-1209184-A1 | PHOTOSENSITIVE LOW-PERMITTIVITY POLYIMIDE AND METHOD OF FORMING POSITIVE POLYIMIDE FILM PATTERN FROM THE SAME | PI R & D Co., Ltd. (JP) | 2002-05-29 | — | — | EP | disclosed |
| EP-1123954-A1 | COMPOSITION FOR POLYIMIDE ELECTRODEPOSITION AND METHOD OF FORMING PATTERNED POLYIMIDE FILM WITH THE SAME | PI R & D Co., Ltd. (JP) | 2001-08-16 | — | — | EP | disclosed |