⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4426266 | 0.96 | — | — | |
| SCHEMBL25600 | 0.67 | — | — | |
| SCHEMBL2869999 | 0.67 | — | — | |
| Methanesulfonic Acid Methyl Ester SCHEMBL16060132 | 0.67 | USP2 (1.00) | — | |
| Methanesulfonic Acid Methyl Ester SCHEMBL573583 | 0.67 | — | — | |
| SCHEMBL4445189 | 0.67 | USP2 (0.54) | — | |
| SCHEMBL2343521 | 0.67 | — | — | |
| Methanesulfonic Acid Methyl Ester SCHEMBL63290 | 0.67 | — | — | |
| SCHEMBL6025560 | 0.65 | — | — | |
| Dimethyl Sulfone SCHEMBL28813734 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119019232-A | Preparation method of diether fluorene based on continuous flow reaction | 陕西煤基特种燃料研究院有限公司 | 2024-11-26 | — | — | CN | disclosed |
| CN-110554569-B | Resist composition and patterning method | 信越化学工业株式会社 | 2024-01-16 | — | — | CN | disclosed |
| US-11435665-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-09-06 | — | — | US | disclosed |
| CN-112225646-B | Preparation method of bisphenol TMC | 万华化学集团股份有限公司 | 2022-07-12 | — | — | CN | disclosed |
| CN-112225646-A | Preparation method of bisphenol TMC | 万华化学集团股份有限公司 | 2021-01-15 | — | — | CN | disclosed |
| CN-111393367-A | N-para-sulfonium salt substituted pyrazoline derivative, photocuring composition and preparation method | 浙江扬帆新材料股份有限公司 | 2020-07-10 | — | — | CN | disclosed |
| CN-110554569-A | Resist composition and patterning method | SHINETSU CHEMICAL CO | 2019-12-10 | — | — | CN | disclosed |
| CN-109790178-A | novel cytotoxic agents and conjugates thereof | 宝力泰锐克斯有限公司 | 2019-05-21 | — | — | CN | disclosed |
| CN-109073974-A | The negative photosensitive composition of low-temperature curable | AZ电子材料（卢森堡）有限公司 | 2018-12-21 | — | — | CN | disclosed |
| CN-107077070-A | The manufacture method of photosensitive polymer combination, cured film, the element for possessing cured film and semiconductor devices | 东丽株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-101387829-A | Radiation-sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2009-03-18 | — | — | CN | disclosed |
| US-7371503-B2 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| CN-101003509-A | New pharmic acceptable salt of pyritinol, and preparation method | HUANG ZHENHUA (CN) | 2007-07-25 | — | — | CN | disclosed |
| US-7235343-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-26 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20040229162-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-18 | — | — | US | disclosed |
| CN-1046711-C | Unsaturated hydroxyalkyl quinoline carboxylic acids as leukotriene antagonists | MERCK FROSST CANADA INC (CA) | 1999-11-24 | — | — | CN | disclosed |
| US-5648196-A | Water-soluble photoinitiators | CORNELL RESEARCH FOUNDATION, INC. (US) | 1997-07-15 | — | — | US | disclosed |
| CN-1061407-A | Unsaturated hydroxyalkyl quinoline carboxylic acids as leukotriene antagonists | MERCK FROSST CANADA INC (CA) | 1992-05-27 | — | — | CN | disclosed |