SCHEMBL17965713

SCHEMBL17965713

CCCCCCCC#CI

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN7 P35236 5/20 0.46
HMGCR P04035 3/20 0.46
TSHR P16473 2/20 0.44
THRB P10828 1/20 0.44
RECQL P46063 2/20 0.42
TDP1 Q9NUW8 2/20 0.42
KCNH2 Q12809 1/20 0.39
ALDH1A1 P00352 2/20 0.39
KDM4E B2RXH2 1/20 0.39
MEN1 O00255 1/20 0.39
USP2 O75604 1/20 0.39
POLB P06746 1/20 0.39
MAPT P10636 1/20 0.39
HPGD P15428 1/20 0.39
ALOX12 P18054 1/20 0.39
BLM P54132 1/20 0.39
KMT2A Q03164 1/20 0.39
MCL1 Q07820 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
EPHX2 P34913 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10397037 1.00 PTPN7 (0.46) PTPN7HMGCRTSHRTHRBRECQL
SCHEMBL10615871 1.00 PTPN7 (0.46) PTPN7HMGCRTSHRTHRBRECQL
SCHEMBL4059174 1.00
SCHEMBL20838863 1.00 PTPN7 (0.46) PTPN7HMGCRTSHRTHRBRECQL
SCHEMBL4054911 1.00 PTPN7 (0.46) PTPN7HMGCRTSHRTHRBRECQL
SCHEMBL10803813 1.00 PTPN7 (0.46) PTPN7HMGCRTSHRTHRBRECQL
SCHEMBL4053189 0.97
SCHEMBL4224656 0.93 HMGCR (0.53) PTPN7HMGCRTSHRTHRBRECQL
SCHEMBL4055283 0.88
SCHEMBL23040316 0.82 PTPN7 (0.61) PTPN7HMGCRTSHRTHRBRECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023162998-A1 COMPOSITION INCLUDING IODO COMPOUND AND USE FOR SAME 東ソー株式会社 2023-08-31 WO disclosed
EP-3018118-B1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2023-07-05 EP disclosed
CN-105859529-B Method for producing asymmetric conjugated diyne compound and method for producing Z, Z-conjugated diene compound using the same 信越化学工业株式会社 2020-10-16 CN disclosed
CN-105339340-B Generated base alkaline agent, the alkali reactive composition containing the generated base alkaline agent and production alkali method 富士胶片和光纯药株式会社 2018-10-12 CN disclosed
EP-3053906-B1 METHOD FOR PRODUCING ASYMMETRIC CONJUGATED DIYNE COMPOUND AND METHOD FOR PRODUCING Z,Z-CONJUGATED DIENE COMPOUND USING THE SAME SHINETSU CHEMICAL CO (JP) 2017-12-27 EP disclosed
US-9845304-B2 Method for producing asymmetric conjugated diyne compound and method for producing Z,Z-conjugated diene compound using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-19 US disclosed
US-20160229829-A1 Method for Producing Asymmetric Conjugated Diyne Compound and Method for Producing Z,Z-Conjugated Diene Compound Using the Same SHIN-ETSU CHEMICAL CO., LTD (JP) 2016-08-11 US disclosed
EP-3053906-A1 METHOD FOR PRODUCING ASYMMETRIC CONJUGATED DIYNE COMPOUND AND METHOD FOR PRODUCING Z,Z-CONJUGATED DIENE COMPOUND USING THE SAME Shin-Etsu Chemical Co., Ltd. (JP) 2016-08-10 EP disclosed
CN-105339340-A Base generator, base-reactive composition containing said base generator, and base generation method WAKO PURE CHEM IND LTD 2016-02-17 CN disclosed