SCHEMBL17968258

SCHEMBL17968258

CO[Si](CCCOC(=O)Cc1ccccc1)(OC)OC

nearest known ligand 0.51

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.51
L3MBTL1 Q9Y468 2/20 0.51
MAPK1 P28482 1/20 0.51
ALOX5 P09917 1/20 0.50
PAM P19021 1/20 0.50
MAPT P10636 1/20 0.46
TSHR P16473 2/20 0.45
KMT2A Q03164 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
GAA P10253 1/20 0.43
KLK7 P49862 1/20 0.43
CYP19A1 P11511 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
NPC1 O15118 1/20 0.41
ADRB2 P07550 1/20 0.41
ADRB1 P08588 1/20 0.41
ADRB3 P13945 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17968260 0.91 ALDH1A1 (0.54) ALDH1A1L3MBTL1MAPK1ALOX5PAM
SCHEMBL17968277 0.87 ALDH1A1 (0.46) ALDH1A1L3MBTL1MAPTTSHRKMT2A
SCHEMBL3910867 0.87 CYP19A1 (0.58) ALDH1A1L3MBTL1TSHRGAACYP19A1
SCHEMBL17968264 0.85 TDP1 (0.66) ALDH1A1ALOX5MAPTTDP1SMN1; SMN2
SCHEMBL17968300 0.85 ALDH1A1 (0.49) ALDH1A1L3MBTL1MAPK1ALOX5PAM
SCHEMBL4570308 0.82 ALDH1A1 (0.68) ALDH1A1L3MBTL1MAPK1ALOX5PAM
SCHEMBL13291851 0.82 ALDH1A1 (0.68) ALDH1A1L3MBTL1MAPK1ALOX5PAM
SCHEMBL17968279 0.81 CTBP2 (0.39) ALDH1A1L3MBTL1ALOX5MAPTTSHR
SCHEMBL17968268 0.81 ALDH1A1 (0.58) ALDH1A1L3MBTL1MAPK1ALOX5PAM
SCHEMBL28565079 0.81 ALDH1A1 (0.58) ALDH1A1L3MBTL1MAPK1ALOX5PAM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10109485-B2 Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-10-23 US disclosed
US-9971245-B2 Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-15 US disclosed
US-20170154766-A1 SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-01 US disclosed
US-20160229939-A1 SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed