Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM1 | P11229 | 4/20 | 0.43 |
| ▸ | CHRM3 | P20309 | 4/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 3/20 | 0.43 |
| ▸ | CHRM4 | P08173 | 3/20 | 0.43 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.42 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17968297 | 0.92 | PTGS1 (0.43) | CHRM1CHRM3CHRM2CHRM4PTGS1 | |
| SCHEMBL17968266 | 0.90 | NPC1 (0.43) | CHRM1CHRM3CHRM2CHRM4SMN1; SMN2 | |
| SCHEMBL17968286 | 0.86 | CHRM2 (0.42) | CHRM1CHRM3CHRM2CHRM4PTGS1 | |
| SCHEMBL17968263 | 0.82 | PTGS1 (0.42) | PTGS1PTGS2SMN1; SMN2LMNACYP1A2 | |
| SCHEMBL17968289 | 0.82 | GPR88 (0.43) | CHRM1CHRM3CHRM2CHRM4PTGS1 | |
| SCHEMBL13156984 | 0.81 | TSHR (0.54) | CHRM1CHRM3CHRM2CHRM4SMN1; SMN2 | |
| SCHEMBL11808202 | 0.81 | TSHR (0.54) | CHRM1CHRM3CHRM2CHRM4SMN1; SMN2 | |
| SCHEMBL15896735 | 0.81 | TSHR (0.54) | CHRM1CHRM3CHRM2CHRM4SMN1; SMN2 | |
| SCHEMBL2291006 | 0.79 | NPC1 (0.57) | CHRM1CHRM3CHRM2CHRM4SMN1; SMN2 | |
| SCHEMBL13156906 | 0.79 | NPC1 (0.57) | CHRM1CHRM3CHRM2CHRM4SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10109485-B2 | Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-10-23 | — | — | US | disclosed |
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20170154766-A1 | SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-01 | — | — | US | disclosed |
| US-20160229939-A1 | SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |