SCHEMBL179866

SCHEMBL179866

C=C(C)C(=O)NNCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL4440371 0.98 ALDH1A1 (0.39)
SCHEMBL3279670 0.81 HDAC3 (0.39)
SCHEMBL19639641 0.81 HDAC3 (0.33)
Hydrochloric Acid SCHEMBL329123 0.79 HDAC3 (0.38)
SCHEMBL1880926 0.78 HDAC3 (0.31)
SCHEMBL25316068 0.78 ALDH1A1 (0.50)
SCHEMBL3283264 0.78 HDAC3 (0.42)
Hydrochloric Acid SCHEMBL4867848 0.78 HDAC3 (0.37)
SCHEMBL2555407 0.76 ALDH1A1 (0.42)
Methacrylic Acid SCHEMBL27551279 0.76 ALDH1A1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7700540-B2 Hard surface cleaning composition THE CLOROX COMPANY (US) 2010-04-20 US claimed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US claimed
CN-113889622-B Binder, negative electrode and lithium ion battery 比亚迪股份有限公司 2023-07-11 CN disclosed
CN-113889622-A Binder, negative electrode and lithium ion battery 比亚迪股份有限公司 2022-01-04 CN disclosed
US-11046803-B2 Block copolymer and surface treatment agent using same TOSOH CORPORATION (JP) 2021-06-29 US disclosed
US-20190194376-A1 BLOCK COPOLYMER AND SURFACE TREATMENT AGENT USING SAME TOSOH CORPORATION (JP) 2019-06-27 US disclosed
EP-3495400-A1 BLOCK COPOLYMER AND SURFACE TREATMENT AGENT USING SAME Tosoh Corporation (JP) 2019-06-12 EP disclosed
EP-3052534-B1 METHOD FOR MAKING UV-ABSORBING OPHTHALMIC LENSES NOVARTIS AG (CH) 2019-05-01 EP disclosed
US-9568645-B2 Silicone hydrogel lenses with relatively-long thermal stability NOVARTIS AG (CH) 2017-02-14 US disclosed
EP-3052535-A1 SILICONE HYDROGEL LENSES WITH RELATIVELY-LONG THERMAL STABILITY Novartis AG (CH) 2016-08-10 EP disclosed
EP-3052534-A1 METHOD FOR MAKING UV-ABSORBING OPHTHALMIC LENSES Novartis AG (CH) 2016-08-10 EP disclosed
WO-2015048279-A1 SILICONE HYDROGEL LENSES WITH RELATIVELY-LONG THERMAL STABILITY NOVARTIS AG (CH) 2015-04-02 WO disclosed
EP-1006133-B2 POLYURETHANE FOAM, PROCESS FOR PRODUCING THE SAME, AND FOAM FORMING COMPOSITION SANYO CHEMICAL IND LTD (JP) 2012-01-04 EP disclosed
US-7700540-B2 Hard surface cleaning composition THE CLOROX COMPANY (US) 2010-04-20 US disclosed
EP-1006133-B9 POLYURETHANE FOAM, PROCESS FOR PRODUCING THE SAME, AND FOAM FORMING COMPOSITION SANYO CHEMICAL IND LTD (JP) 2008-01-09 EP disclosed
EP-1006133-B1 POLYURETHANE FOAM, PROCESS FOR PRODUCING THE SAME, AND FOAM FORMING COMPOSITION SANYO CHEMICAL IND LTD (JP) 2007-11-21 EP disclosed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US disclosed
US-6455606-B1 POLYURETHANE FOAM HAVING A STRUCTURE IN WHICH POLYMER CHAINS FORMED BY AN ADDITION-POLYMERIZATION REACTION AND POLYURETHANE CHAIN ARE CROSSLINKED TO EACH OTHER, EXCELLENT MECHANICAL PROPERTIES, DIMENSIONAL STABILITY SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2002-09-24 US disclosed
US-20020052425-A1 POLYURETHANE FOAM, PROCESS FOR PRODUCING THE SAME, AND FOAM FORMING COMPOSITION SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2002-05-02 US disclosed
EP-1006133-A1 POLYURETHANE FOAM, PROCESS FOR PRODUCING THE SAME, AND FOAM FORMING COMPOSITION SANYO CHEMICAL INDUSTRIES, Ltd. (JP) 2000-06-07 EP disclosed