⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27620003 | 1.00 | — | — | |
| SCHEMBL14740684 | 0.96 | — | — | |
| SCHEMBL11129533 | 0.96 | — | — | |
| Water SCHEMBL5697496 | 0.96 | ALDH1A1 (0.83) | — | |
| SCHEMBL1331977 | 0.95 | — | — | |
| SCHEMBL523 | 0.95 | — | — | |
| SCHEMBL1330344 | 0.95 | — | — | |
| SCHEMBL1331774 | 0.95 | — | — | |
| SCHEMBL9866292 | 0.95 | — | — | |
| SCHEMBL5305593 | 0.95 | ALDH1A1 (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109240015-A | A kind of production method of electrochomeric glass | 揭阳市宏光镀膜玻璃有限公司 | 2019-01-18 | — | — | CN | claimed |
| CN-107827371-A | A kind of preparation method of nanometer of organic composite electro-allochromatic nickel oxide film | 上海艾谡新材料有限公司 | 2018-03-23 | — | — | CN | claimed |
| CN-107673628-A | A kind of preparation method of porous NiO electrochomeric films | 上海艾谡新材料有限公司 | 2018-02-09 | — | — | CN | claimed |
| US-20250243388-A1 | CONDUCTIVE PASTE AND CURED PRODUCT | THREEBOND CO., LTD. (JP) | 2025-07-31 | — | — | US | disclosed |
| EP-4112327-B1 | LAMINATES AND IDENTIFICATION DOCUMENTS | TOPPAN PRINTING CO LTD (JP) | 2024-10-30 | — | — | EP | disclosed |
| US-20240224413-A1 | WIRING SUBSTRATE | RESONAC CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-4325554-A1 | WIRING SUBSTRATE | Resonac Corporation (JP) | 2024-02-21 | — | — | EP | disclosed |
| CN-116675199-A | Dumbbell-shaped basic phosphate material and preparation method and application thereof | 陕西理工大学 | 2023-09-01 | — | — | CN | disclosed |
| CN-116651490-A | Multistage radial microspheric basic phosphate-carbon nitride composite material and preparation method and application thereof | 陕西理工大学 | 2023-08-29 | — | — | CN | disclosed |
| EP-4112327-A1 | LAMINATES IDENTIFICATION DOCUMENTS, AND METHODS FOR VERIFYING IDENTIFICATION DOCUMENTS | Toppan Printing Co., Ltd. (JP) | 2023-01-04 | — | — | EP | disclosed |
| EP-3674099-B1 | LAMINATED BODY, IDENTIFICATION, AND IDENTIFICATION VERIFYING METHOD | TOPPAN PRINTING CO LTD (JP) | 2022-09-28 | — | — | EP | disclosed |
| US-7001829-B1 | Semiconductor device and method of manufacturing the same | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2006-02-21 | — | — | US | disclosed |
| US-6995228-B2 | Copolymer of conjugated cyclodiene | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2006-02-07 | — | — | US | disclosed |
| US-6987036-B2 | Method for forming crystalline semiconductor film and apparatus for forming the same | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2006-01-17 | — | — | US | disclosed |
| US-20050037554-A1 | Method for manufacturing semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO.,LTD., A JAPAN CORPORATION | 2005-02-17 | — | — | US | disclosed |
| US-20040242825-A1 | Copolymer of conjugated cyclodiene | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-12-02 | — | — | US | disclosed |
| US-20030181580-A1 | Grafting-modified cyclic polymer, process for producing the same, and curable composition | ZEON CORPORATION (JP) | 2003-09-25 | — | — | US | disclosed |
| EP-1302488-A1 | GRAFTING-MODIFIED CYCLIC POLYMER, PROCESS FOR PRODUCING THE SAME, AND CURABLE COMPOSITION | Zeon Corporation (JP) | 2003-04-16 | — | — | EP | disclosed |
| US-20030032267-A1 | Method for forming crystalline semiconductor film and apparatus for forming the same | SEMICONDUCTOR ENERGY LABORATOY CO., LTD. (JP) | 2003-02-13 | — | — | US | disclosed |
| EP-0617439-B1 | Thin film capacitor and method of manufacturing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2003-01-08 | — | — | EP | disclosed |