Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1802875 | 0.89 | HSD17B10 (0.42) | SMN1; SMN2KDM4ELMNACYP2C19HSD17B10 | |
| SCHEMBL1803803 | 0.83 | KDM4E (0.40) | SMN1; SMN2KDM4ELMNACYP2C19TSHR | |
| SCHEMBL29950071 | 0.78 | SMN1; SMN2 (0.32) | SMN1; SMN2 | |
| SCHEMBL38953 | 0.75 | SMN1; SMN2 (0.56) | SMN1; SMN2KDM4ELMNACYP2C19TSHR | |
| SCHEMBL4124849 | 0.74 | SMN1; SMN2 (0.35) | SMN1; SMN2 | |
| SCHEMBL1802571 | 0.73 | HSD17B10 (0.42) | SMN1; SMN2KDM4ELMNACYP2C19HSD17B10 | |
| Water SCHEMBL4837114 | 0.73 | SMN1; SMN2 (0.54) | SMN1; SMN2KDM4ELMNACYP2C19TSHR | |
| Iodide SCHEMBL11830139 | 0.73 | SMN1; SMN2 (0.54) | SMN1; SMN2KDM4ELMNACYP2C19TSHR | |
| Hydrochloric Acid SCHEMBL20704047 | 0.73 | SMN1; SMN2 (0.54) | SMN1; SMN2KDM4ELMNACYP2C19TSHR | |
| Water SCHEMBL7733637 | 0.73 | SMN1; SMN2 (0.54) | SMN1; SMN2KDM4ELMNACYP2C19TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2011052759-A1 | NOVEL NITROXYL RADICAL COMPOUND AND PROCESS FOR PRODUCTION THEREOF | 国立大学法人九州大学 (JP) | 2011-05-05 | — | — | WO | disclosed |