Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3130050 | 1.00 | CA1 (0.34) | CA1CA2 | |
| SCHEMBL548225 | 0.99 | CA1 (0.33) | CA1CA2 | |
| SCHEMBL3132695 | 0.88 | GAA (0.37) | CA1CA2 | |
| SCHEMBL3144464 | 0.88 | GAA (0.37) | CA1CA2 | |
| SCHEMBL1088919 | 0.88 | GAA (0.37) | CA1CA2 | |
| SCHEMBL3132260 | 0.88 | GAA (0.37) | CA1CA2 | |
| SCHEMBL5432693 | 0.87 | SOS1 (0.36) | CA1CA2 | |
| SCHEMBL270992 | 0.86 | GAA (0.38) | — | |
| SCHEMBL3126974 | 0.86 | GAA (0.38) | — | |
| SCHEMBL5439943 | 0.86 | SOS1 (0.37) | CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1676835-B1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-8771923-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| US-20130108962-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-8389202-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2013-03-05 | — | — | US | disclosed |
| US-8377627-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8361691-B2 | Radiation-sensitive composition and process for producing low-molecular compound for use therein | JSR CORPORATION (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| US-8173351-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-7977442-B2 | Radiation-sensitive composition, polymer and monomer | JSR CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20110117489-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2011-05-19 | — | — | US | disclosed |
| US-6846607-B2 | Carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-25 | — | — | US | disclosed |
| US-6830868-B2 | Useful as a chemically amplified resist responding to active radiation, for example ultraviolet rays such as a KrF excimer laser, ArF excimer laser, and F2 excimer laser | JSR CORPORATION (JP) | 2004-12-14 | — | — | US | disclosed |
| EP-1482361-A1 | ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER | NIPPON SODA CO., LTD. (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-6821705-B2 | USED AS CHEMICALLY AMPLIFIED RESIST, EXHIBITS HIGH SENSITIVITY, RESOLUTION, RADIATION TRANSMITTANCE, AND SURFACE SMOOTHNESS, AND IS FREE FROM THE PROBLEM OF PARTIAL INSOLUBLIZATION DURING OVEREXPOSURE | JSR CORPORATION (JP) | 2004-11-23 | — | — | US | disclosed |
| US-6770780-B1 | QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS | JSR CORPORATION (JP) | 2004-08-03 | — | — | US | disclosed |
| US-20030194634-A1 | Novel anthracene derivative and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1343048-A2 | Anthracene derivative and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030194634-A1 | Novel anthracene derivative and radiation-sensitive resin composition | SRSF1, ARL1, ERCC4 | CA1 393/4885CA2 927/4885 |
| US-20110117489-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | ERCC2, RAD51, ATM | CA1 2469/4885CA2 4758/4885 |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | RAD51, PYM1, MRE11 | CA1 1065/4885CA2 2553/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.