SCHEMBL3144464

SCHEMBL3144464

COc1ccc([S+](c2ccccc2)c2ccc(OC)cc2)cc1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.37
KMT2A Q03164 1/20 0.37
HSD11B1 P28845 1/20 0.36
KCNH2 Q12809 1/20 0.36
NFE2L2 Q16236 3/20 0.35
PPARG P37231 1/20 0.35
PKM P14618 2/20 0.35
ALDH1A1 P00352 5/20 0.35
PGR P06401 2/20 0.34
LMNA P02545 1/20 0.33
HTT P42858 1/20 0.33
POLB P06746 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
SQSTM1 Q13501 1/20 0.33
KEAP1 Q14145 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1088919 1.00 GAA (0.37) GAAKMT2AHSD11B1KCNH2NFE2L2
SCHEMBL3132260 1.00 GAA (0.37) GAAKMT2AHSD11B1KCNH2NFE2L2
SCHEMBL3132695 1.00 GAA (0.37) GAAKMT2AHSD11B1KCNH2NFE2L2
SCHEMBL270992 0.99 GAA (0.38) GAAKMT2AHSD11B1KCNH2NFE2L2
SCHEMBL3126974 0.99 GAA (0.38) GAAKMT2AHSD11B1KCNH2NFE2L2
SCHEMBL1593149 0.95 GAA (0.39) GAAKMT2AHSD11B1KCNH2NFE2L2
SCHEMBL503835 0.95 HSD11B1 (0.40) GAAKMT2AHSD11B1KCNH2PKM
SCHEMBL454990 0.93 HSD11B1 (0.40) GAAKMT2AHSD11B1KCNH2PKM
SCHEMBL2898530 0.90 ACHE (0.39) GAAKMT2AHSD11B1PKMALDH1A1
SCHEMBL5432693 0.90 SOS1 (0.36) PGRLMNAHTTSMN1; SMN2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed