⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2270077 | 0.67 | — | — | |
| SCHEMBL6310944 | 0.62 | — | — | |
| SCHEMBL721890 | 0.60 | — | — | |
| SCHEMBL8031969 | 0.57 | — | — | |
| SCHEMBL707890 | 0.52 | — | — | |
| SCHEMBL8385757 | 0.50 | — | — | |
| SCHEMBL17024502 | 0.49 | — | — | |
| SCHEMBL705433 | 0.47 | — | — | |
| SCHEMBL263958 | 0.46 | — | — | |
| SCHEMBL149912 | 0.46 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230279031-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST, INC. | 2023-09-07 | — | — | US | claimed |
| EP-3274354-B1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST TECH INC (US) | 2019-07-03 | — | — | EP | claimed |
| EP-3274354-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | Gelest Technologies Inc. (US) | 2018-01-31 | — | — | EP | claimed |
| US-20160280724-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST, INC. | 2016-09-29 | — | — | US | claimed |
| WO-2016153929-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST TECHNOLOGIES, INC. (US) | 2016-09-29 | — | — | WO | claimed |
| US-20230279031-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST, INC. | 2023-09-07 | — | — | US | disclosed |
| US-11702434-B2 | N-alkyl substituted cyclic and oligomeric perhydridosilazanes, methods of preparation thereof, and silicon nitride films formed therefrom | GELEST, INC. (US) | 2023-07-18 | — | — | US | disclosed |
| US-20210206786-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST TECHNOLOGIES, INC. | 2021-07-08 | — | — | US | disclosed |
| US-11001599-B2 | N-alkyl substituted cyclic and oligomeric perhydridosilazanes, methods of preparation thereof, and silicon nitride films formed therefrom | GELEST TECHNOLOGIES, INC. (US) | 2021-05-11 | — | — | US | disclosed |
| EP-3274354-B1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST TECH INC (US) | 2019-07-03 | — | — | EP | disclosed |
| EP-3274354-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | Gelest Technologies Inc. (US) | 2018-01-31 | — | — | EP | disclosed |
| WO-2016153929-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST TECHNOLOGIES, INC. (US) | 2016-09-29 | — | — | WO | disclosed |
| US-20160280724-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST, INC. | 2016-09-29 | — | — | US | disclosed |