⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6310944 | 0.67 | — | — | |
| SCHEMBL2270077 | 0.64 | — | — | |
| SCHEMBL1094498 | 0.61 | — | — | |
| SCHEMBL19275257 | 0.61 | — | — | |
| SCHEMBL1322396 | 0.56 | — | — | |
| SCHEMBL2531980 | 0.56 | — | — | |
| SCHEMBL707890 | 0.56 | — | — | |
| SCHEMBL647384 | 0.56 | — | — | |
| SCHEMBL22207749 | 0.53 | — | — | |
| Methane SCHEMBL4158420 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118063409-A | Preparation method of cefdinir and intermediate thereof | 江苏美迪克化学品有限公司 | 2024-05-24 | — | — | CN | claimed |
| CN-113403604-B | Composition and method for depositing silicon nitride films | 弗萨姆材料美国有限责任公司 | 2024-06-14 | — | — | CN | disclosed |
| CN-118063409-A | Preparation method of cefdinir and intermediate thereof | 江苏美迪克化学品有限公司 | 2024-05-24 | — | — | CN | disclosed |
| US-6022814-A | COATING A POLYSILOXANE/SILSESQUIOXANE ON THE SUBSTRATE; HEATING TO A TEMPERATURE RANGING FROM 250.DEGREE. C. TO THE GLASS TRANSITION POINT OF THE POLYMER; DIELECTRIC FILM OF LOW DENSITY AND A LARGE FREE VOLUME; HEAT RESISTANCE | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-02-08 | — | — | US | disclosed |