SCHEMBL1812157

SCHEMBL1812157

Nc1ccccc1SCCc1c(C(=O)O)ccc(C(=O)O)c1CCSc1ccccc1N

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MCL1 Q07820 1/20 0.49
▸ BCL2A1 Q16548 1/20 0.49
▸ CYP1A2 P05177 1/20 0.44
▸ POLB P06746 2/20 0.43
▸ CA12 O43570 2/20 0.42
▸ CA1 P00915 2/20 0.42
▸ CA2 P00918 2/20 0.42
▸ CA4 P22748 2/20 0.42
▸ CA7 P43166 2/20 0.42
▸ CA9 Q16790 2/20 0.42
▸ CA3 P07451 1/20 0.42
▸ CA6 P23280 1/20 0.42
▸ CA13 Q8N1Q1 1/20 0.42
▸ CA14 Q9ULX7 1/20 0.42
▸ CA5B Q9Y2D0 1/20 0.42
▸ HSD17B10 Q99714 1/20 0.42
▸ MEN1 O00255 3/20 0.41
▸ KMT2A Q03164 3/20 0.41
▸ RAB9A P51151 2/20 0.41
▸ KDM4E B2RXH2 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11301369 0.91 MCL1 (0.43) MCL1BCL2A1CYP1A2POLBCA12
SCHEMBL11297227 0.83 POLB (0.55) MCL1BCL2A1CYP1A2POLBCA12
SCHEMBL11303910 0.78 MAPT (0.52) MEN1KMT2ARAB9AKDM4EALDH1A1
SCHEMBL9701297 0.74 MEN1 (0.54) CYP1A2POLBHSD17B10MEN1KMT2A
SCHEMBL11368067 0.74 POLB (0.39) MCL1BCL2A1CYP1A2POLBCA12
SCHEMBL27967723 0.74 MCL1 (0.49) MCL1BCL2A1POLBCA12CA1
SCHEMBL11301366 0.73 POLB (0.41) CYP1A2POLBCA12CA1CA2
SCHEMBL29351476 0.72 MEN1 (0.62) CYP1A2POLBHSD17B10MEN1KMT2A
SCHEMBL292217 0.72 MEN1 (0.62) CYP1A2POLBHSD17B10MEN1KMT2A
SCHEMBL6231914 0.71 CYP1A2 (0.71) CYP1A2POLBCA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1715980-B1 BASE PAD POLISHING PAD AND MULTI-LAYER PAD COMPRISING THE SAME SKC CO LTD (KR) 2011-05-18 — — EP disclosed
US-7381121-B2 Base pad polishing pad and multi-layer pad comprising the same SKC CO., LTD. (KR) 2008-06-03 — — US disclosed
US-20070254564-A1 Base Pad Polishing Pad and Multi-Layer Pad Comprising the Same SKC CO., LTD. (KR) 2007-11-01 — — US disclosed
EP-1715980-A1 BASE PAD POLISHING PAD AND MULTI-LAYER PAD COMPRISING THE SAME SKC Co., Ltd. (KR) 2006-11-02 — — EP disclosed
WO-2005077602-A1 BASE PAD POLISHING PAD AND MULTI-LAYER PAD COMPRISING THE SAME SKC CO., LTD. (KR) 2005-08-25 — — WO disclosed
US-6403063-B1 APPLYING POLYUREA; CURING SAWYER KENNETH I (US) 2002-06-11 — — US disclosed
US-6401724-B1 POLYUREA-FORMING COMPOSITION SUCH AS 1)AN AMINOBENZOIC ACID ESTER OR AMIDE OF A POSSIBLY OLIGOMERIC POLYOL OR POLYAMINE OR AN AROMATIC DIAMINE AND 2)A POLYISOCYANATE PAR PHARMACEUTICALS INCORPORATED 2002-06-11 — — US disclosed
WO-2000069943-A1 POLYUREA COMPOSITION K & L TECHNOLOGIES, INC. (US) 2000-11-23 — — WO disclosed
EP-0538850-B1 New polyurea resins and their preparation and use IHARA CHEMICAL IND CO (JP) 1997-01-22 — — EP disclosed
US-5319058-A Improved heat resistance when polyisocyanate component is a combination of an aliphatic diisocyanate and a cyclic trimer of an aliphatic polyisocyanate IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 1994-06-07 — — US disclosed
US-4342859-A Bis(aminophenylthioalkyl)terephthalate and hardener for polyurethane elastomer thereof IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 1982-08-03 — — US disclosed
Send feedback