⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL225608 | 0.77 | FBP1 (0.55) | — | |
| SCHEMBL29543966 | 0.77 | RHEB (0.55) | — | |
| SCHEMBL31464849 | 0.77 | FBP1 (0.55) | — | |
| SCHEMBL6915666 | 0.77 | RHEB (0.55) | — | |
| SCHEMBL1846441 | 0.74 | — | — | |
| SCHEMBL30548744 | 0.74 | RHEB (0.53) | — | |
| SCHEMBL23297135 | 0.74 | IDO1 (0.40) | — | |
| SCHEMBL1816008 | 0.72 | — | — | |
| SCHEMBL515471 | 0.72 | — | — | |
| SCHEMBL4907076 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10394127-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2019-08-27 | — | — | US | disclosed |
| US-20180017872-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2018-01-18 | — | — | US | disclosed |
| US-9557643-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| US-9429840-B2 | Pattern forming method, composition used therein, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-30 | — | — | US | disclosed |
| EP-2354187-B1 | DISPERSED COMPOSITION, POLYMERIZABLE COMPOSITION, LIGHT SHIELDING COLOR FILTER, SOLID-STATE IMAGING ELEMENT, LIQUID CRYSTAL DISPLAY DEVICE, WAFER-LEVEL LENS, AND IMAGING UNIT | FUJIFILM CORP (JP) | 2016-03-02 | — | — | EP | disclosed |
| US-9223208-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20150118627-A1 | PATTERN FORMING METHOD, COMPOSITION USED TEHREIN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |
| EP-2037323-B1 | Photosensitive compositions | FUJIFILM CORP (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-20140349224-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-11-27 | — | — | US | disclosed |
| US-8895909-B2 | Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor | FUJIFILM CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20100044817-A1 | PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND METHOD OF PRODUCING THE SAME, AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2010-02-25 | — | — | US | disclosed |
| EP-2157130-A1 | Photosensitive resin composition, color filter and method of producing the same, and solid-state imaging device | Fujifilm Corporation (JP) | 2010-02-24 | — | — | EP | disclosed |
| EP-2120094-A2 | Black photosensitive resin composition, and color filter and method of producing the same | Fujifilm Corporation (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-20090280416-A1 | BLACK PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER AND METHOD OF PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2009-11-12 | — | — | US | disclosed |
| EP-2112182-A1 | Polymerizable composition, light-shielding color filter, black curable composition, light-shielding color filter for solid-state image pickup device and method of producing the same, and solid-state image pickup device | FUJIFILM Corporation (JP) | 2009-10-28 | — | — | EP | disclosed |
| EP-2105443-A1 | Oxime derivatives and their use in photopolymerizable compositions for colour filters | FUJIFILM Corporation (JP) | 2009-09-30 | — | — | EP | disclosed |
| US-20090236509-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER, METHOD OF PRODUCING THE SAME AND SOLID-STATE IMAGE SENSOR | FUJIFILM CORPORATION (JP) | 2009-09-24 | — | — | US | disclosed |
| EP-2103966-A2 | Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor | FUJIFILM Corporation (JP) | 2009-09-23 | — | — | EP | disclosed |
| EP-2037323-A2 | Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors | FUJIFILM Corporation (JP) | 2009-03-18 | — | — | EP | disclosed |
| US-20090023085-A1 | Photosensitive Compositions, Curable Compositions, Novel Compounds, Photopolymerizable Compositions, Color Filters, and Planographic Printing Plate Precursors | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |