SCHEMBL18167751

SCHEMBL18167751

Oc1ccc(C2(c3ccccc3)c3cc(-c4ccccc4)ccc3-c3ccc(-c4ccccc4)cc32)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDK2 Q15119 2/20 0.51
MMP3 P08254 1/20 0.50
BCL2L1 Q07817 1/20 0.50
ESR1 P03372 7/20 0.47
MEN1 O00255 3/20 0.47
KMT2A Q03164 3/20 0.47
ESR2 Q92731 7/20 0.44
HSD17B1 P14061 1/20 0.44
HSD17B2 P37059 1/20 0.44
ALOX5 P09917 2/20 0.43
NTSR1 P30989 1/20 0.42
ABL1 P00519 1/20 0.42
ABCB1 P08183 1/20 0.42
BCR P11274 1/20 0.42
KDM4E B2RXH2 1/20 0.41
USP2 O75604 1/20 0.41
ALDH1A1 P00352 1/20 0.41
LMNA P02545 1/20 0.41
HSP90AA1 P07900 1/20 0.41
GAA P10253 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29601324 0.98 PDK2 (0.53) PDK2MMP3BCL2L1ESR1MEN1
SCHEMBL20795861 0.98 PDK2 (0.53) PDK2MMP3BCL2L1ESR1MEN1
SCHEMBL18184911 0.95 PDK2 (0.55) PDK2MMP3BCL2L1ESR1MEN1
SCHEMBL18184913 0.91 PDK2 (0.49) PDK2MMP3BCL2L1ESR1MEN1
SCHEMBL22199546 0.88 PDK2 (0.45) PDK2MMP3BCL2L1ESR1MEN1
SCHEMBL18184912 0.88 ESR2 (0.57) PDK2ESR1MEN1KMT2AESR2
SCHEMBL18184906 0.87 PDK2 (0.52) PDK2MMP3BCL2L1ESR1MEN1
SCHEMBL2674735 0.85 MMP3 (0.52) PDK2MMP3BCL2L1ESR1MEN1
SCHEMBL29601892 0.85 MMP3 (0.52) PDK2MMP3BCL2L1ESR1MEN1
SCHEMBL27434337 0.85 ABL1 (0.43) PDK2ESR1MEN1KMT2AESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9695279-B2 Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition SK INNOVATION CO., LTD. (KR) 2017-07-04 US disclosed
US-20160311975-A1 Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Forming Resist Underlayer Film Using the Composition SK GEO CENTRIC CO., LTD. (KR) 2016-10-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160311975-A1 Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Forming Resist Underlayer Film Using the Composition PARG, FBXL19, AFF2 PDK2 2632/4885MMP3 3780/4885BCL2L1 1214/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.