SCHEMBL18167752

SCHEMBL18167752

Oc1ccc(C2(c3ccc4ccccc4c3)c3ccccc3-c3ccccc32)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 4/20 0.53
ESR1 P03372 3/20 0.53
MEN1 O00255 4/20 0.49
KMT2A Q03164 4/20 0.49
LMNA P02545 2/20 0.49
MAPT P10636 2/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
KDM4E B2RXH2 1/20 0.49
OPRK1 P41145 1/20 0.49
CYP1A2 P05177 1/20 0.47
HSP90AA1 P07900 2/20 0.46
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
CHRM2 P08172 1/20 0.41
ADORA3 P0DMS8 1/20 0.41
KCNH2 Q12809 1/20 0.41
ALDH1A1 P00352 1/20 0.41
TP53 P04637 1/20 0.41
TYMS P04818 1/20 0.41
CYP3A4 P08684 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18184914 0.95 ESR2 (0.51) ESR2ESR1MEN1KMT2ALMNA
Betanaphthol SCHEMBL28384794 0.93 CYP1A2 (0.57) ESR2ESR1MEN1KMT2ALMNA
SCHEMBL16311015 0.93 ESR2 (0.53) ESR2ESR1MEN1KMT2ALMNA
SCHEMBL16137632 0.93 CYP1A2 (0.57) ESR2ESR1MEN1KMT2ALMNA
SCHEMBL26216183 0.92 ESR2 (0.54) ESR2ESR1MEN1KMT2ALMNA
SCHEMBL29506856 0.90 ESR2 (0.56) ESR2ESR1MEN1KMT2ALMNA
SCHEMBL414334 0.90 ESR2 (0.56) ESR2ESR1MEN1KMT2ALMNA
SCHEMBL30624510 0.90 ESR2 (0.56) ESR2ESR1MEN1KMT2ALMNA
SCHEMBL9974968 0.89 MEN1 (0.53) ESR2ESR1MEN1KMT2ALMNA
SCHEMBL30851345 0.89 MEN1 (0.53) ESR2ESR1MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9695279-B2 Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition SK INNOVATION CO., LTD. (KR) 2017-07-04 US disclosed
US-9695279-B2 Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition SK INNOVATION CO., LTD. (KR) 2017-07-04 US disclosed
US-9695279-B2 Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition SK INNOVATION CO., LTD. (KR) 2017-07-04 US disclosed
US-20160311975-A1 Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Forming Resist Underlayer Film Using the Composition SK GEO CENTRIC CO., LTD. (KR) 2016-10-27 US disclosed
US-20160311975-A1 Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Forming Resist Underlayer Film Using the Composition SK GEO CENTRIC CO., LTD. (KR) 2016-10-27 US disclosed
US-20160311975-A1 Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Forming Resist Underlayer Film Using the Composition SK GEO CENTRIC CO., LTD. (KR) 2016-10-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160311975-A1 Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Forming Resist Underlayer Film Using the Composition PARG, FBXL19, AFF2 ESR2 2104/4885ESR1 3013/4885MEN1 2620/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.